Seongchul Hong
at Hanyang Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 13 March 2015 Paper
Proceedings Volume 9422, 94222E (2015) https://doi.org/10.1117/12.2085755
KEYWORDS: Refractive index, Photons, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Line edge roughness, Optical properties, Lithography

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867928 (2013) https://doi.org/10.1117/12.2011362
KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet lithography, Phase shifts, Line edge roughness, Line width roughness, Extreme ultraviolet, Stochastic processes, Critical dimension metrology, Molybdenum

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