Dr. Seong-Ho Moon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Principal component analysis, Data modeling, Calibration, Logic devices, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Statistical modeling, Model-based design

Proceedings Article | 3 April 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Mathematical modeling, 3D acquisition, Image processing, Image quality, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers, Binary data, 3D image processing

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Manufacturing, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Tolerancing, Array processing

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Data modeling, Calibration, Computer simulations, Image quality, Signal processing, Photomasks, Optical proximity correction, Nanoimprint lithography, System on a chip

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Laser metrology

Showing 5 of 6 publications
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