Mr. Serge Tedesco Profile

Serge Tedesco

Program Manager at Commissariat a l'Energie Atomique

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Author

Publications (11)

Proceedings Article | 4 April 2011 Paper

IMAGINE: an open consortium to boost maskless lithography take off: first assessment results on MAPPER technology

L. Pain, B. Icard, M. Martin, C. Constancias, S. Tedesco, P. Wiedeman, A. Farah, B. Kampherbeek, C. Pieczulewski, H. Kandrashov

Proceedings Volume 7970, 79700Y (2011) https://doi.org/10.1117/12.881286

KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Maskless lithography, Manufacturing, Reliability, Silicon, Electrons, Projection systems, High volume manufacturing

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Proceedings Article | 28 March 2008 Paper

MAGIC: a European program to push the insertion of maskless lithography

L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber

Proceedings Volume 6921, 69211S (2008) https://doi.org/10.1117/12.772472

KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography

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Proceedings Article | 26 March 2007 Paper

Exposure of molecular glass resist by e-beam and EUVIL

Cyril Vannuffel, Damien Djian, Serge Tedesco, Dimitra Niakoula, Panagiotis Argitis, Veroniki Vidali, Elias Couladouros, Harun Solak

Proceedings Volume 6519, 651949 (2007) https://doi.org/10.1117/12.714263

KEYWORDS: Head-mounted displays, Line edge roughness, Cadmium sulfide, Glasses, Molecules, Lithography, Extreme ultraviolet lithography, Photoresist processing, Electron beam lithography, Diffusion

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Proceedings Article | 24 July 2002 Paper

Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application (high resolution) or production application (high sensitivity)

Murielle Charpin, Laurent Pain, Serge Tedesco, C. Gourgon, A. Andrei, Daniel Henry, Yves LaPlanche, Ryotaro Hanawa, Tadashi Kusumoto, Masumi Suetsugu, H. Yokoyama

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474193

KEYWORDS: Polymers, Electron beam lithography, Etching, Lithography, Palladium, Industrial chemicals, Semiconducting wafers, Diffusion, Prototyping, Critical dimension metrology

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Proceedings Article | 24 August 2001 Paper

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

Laurent Pain, C. Gourgon, K. Patterson, B. Scarfogliere, Serge Tedesco, Gilles Fanget, B. Dal'zotto, M. Ribeiro, Tadashi Kusumoto, Masumi Suetsugu, Ryotaro Hanawa

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436854

KEYWORDS: Polymers, Etching, Lithography, Diffusion, FT-IR spectroscopy, Photoresist processing, Deep ultraviolet, Chemically amplified resists, Optical lithography, Statistical analysis

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Proceedings Article | 23 June 2000 Paper

Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists

Laurent Pain, F. Sala, C. Higgins, B. Dal'zotto, Serge Tedesco

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388357

KEYWORDS: Lithography, Critical dimension metrology, Deep ultraviolet, Diffusion, Chemically amplified resists, Electron beam lithography, Photoresist processing, Temperature metrology, Scanning electron microscopy, Chlorine

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Proceedings Article | 16 April 1993 Paper

New dry-development process of trilayer resist systems for advanced lithography

Olivier Joubert, C. Martinet, Jacques Pelletier, Michel Pons, Jean-Marc Francou, Jean-Pierre Panabiere, Andre Weill, Serge Tedesco, Francoise Vinet, Thierry Mourier

Proceedings Volume 1803, (1993) https://doi.org/10.1117/12.142920

KEYWORDS: Etching, Ions, Plasma, Oxygen, Photomasks, Chemical species, Lithography, Anisotropy, Sulfur, Polymers

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Proceedings Article | 1 June 1991 Paper

Applicability of dry developable deep-UV lithography to sub-0.5 um processing

Anne-Marie Goethals, Ki-Ho Baik, Luc Van den Hove, Serge Tedesco

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46408

KEYWORDS: Deep ultraviolet, Silicon, Head-mounted displays, Etching, Lithography, Oxides, Photomasks, Phase shifting, Phase shifts, Photoresist processing

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Proceedings Article | 1 March 1991 Paper

Polysilicon etching for nanometer-scale features

Jean Lajzerowicz, Serge Tedesco, Christophe Pierrat, D. Muyard, M. Taccussel, Philippe Laporte

Proceedings Volume 1392, (1991) https://doi.org/10.1117/12.48916

KEYWORDS: Oxides, Photomasks, Etching, Semiconducting wafers, Photoresist processing, Silicon, Integrated circuits, Carbon, Plasma, Protactinium

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Proceedings Article | 1 June 1990 Paper

Dry etching for high-resolution maskmaking

Serge Tedesco, Christophe Pierrat, Jean Lamure, C. Sourd, Jean-Luc Martin, Jean Guibert

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20185

KEYWORDS: Chromium, Etching, Dry etching, Photoresist processing, Glasses, Semiconducting wafers, Optical lithography, Oxygen, Standards development, Photomasks

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Proceedings Article | 1 May 1990 Paper

PRIME process: an alternative to multiple layer resist systems and high accelerating voltage for e-beam lithography

Serge Tedesco, Christophe Pierrat, Francoise Vinet, Brigitte Florin, Michel Lerme, Jean Guibert

Proceedings Volume 1263, (1990) https://doi.org/10.1117/12.20168

KEYWORDS: X-ray technology, Photoresist processing, Semiconducting wafers, Etching, Resistors, Lithography, Imaging systems, X-ray lithography, X-rays, Multilayers

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Showing 5 of 11 publications

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