Seung-Hee Baek
at Synopsys Korea Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Data modeling, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers, Array processing, EUV optics

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Lithography, Bridges, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies, Data analysis

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Databases, Manufacturing, Computer programming, 3D modeling, Photomasks, Optical proximity correction, Environmental sensing, Current controlled current source, Design for manufacturability

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Nano opto mechanical systems, Image processing, Image quality, Design for manufacturing, Image enhancement, Optical proximity correction, Nanoimprint lithography, Neodymium, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Etching, Particles, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Showing 5 of 9 publications
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