Shady Elshafie
TD Global Support Engineer
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Wafer-level optics, Lithography, Optical properties, Computer simulations, Photomasks, Optical proximity correction, Optical alignment, Geometrical optics, Algorithm development, Semiconducting wafers

Proceedings Article | 15 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Photovoltaics, Metals, Image processing, 3D modeling, Scanning electron microscopy, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Process modeling, Chemical mechanical planarization

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Computer simulations, Bridges, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Image processing, Silicon, Manufacturing, Microelectronics, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 6 publications
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