Dr. Shalini Sharma Profile

Dr. Shalini Sharma

Staff R&D Engineer at JSR Micro Inc

SPIE Involvement:

Author

Proceedings Article | 26 March 2019 Paper

Tilted ion implantation of spin-coated SiARC films for sub-lithographic and two-dimensional patterning

Thomas Rembert, Daniel Connelly, Shalini Sharma, Leonard Rubin, Tsu-Jae King Liu

Proceedings Volume 10958, 109581F (2019) https://doi.org/10.1117/12.2515154

KEYWORDS: Optical lithography, Etching, Argon, Monte Carlo methods, Ion implantation, Photoresist materials, Photomasks, Silicon, Semiconducting wafers, Wet etching

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Proceedings Article | 23 March 2012 Paper

Effects of out-of-band radiation on EUV resist performance

Koji Inukai, Shalini Sharma, Hiroki Nakagawa, Makoto Shimizu, Tooru Kimura

Proceedings Volume 8322, 83220X (2012) https://doi.org/10.1117/12.916596

KEYWORDS: Extreme ultraviolet lithography, Radiation effects, Extreme ultraviolet, Polymers, Absorption, Deep ultraviolet, Absorbance, Lithography, Photoresist materials, Light

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Proceedings Article | 8 March 2012 Paper

EUV resist development for 16nm half pitch

Ken Maruyama, Hiroki Nakagawa, Shalini Sharma, Yoshi Hishiro, Makoto Shimizu, Tooru Kimura

Proceedings Volume 8325, 83250A (2012) https://doi.org/10.1117/12.916555

KEYWORDS: Diffusion, Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Immersion lithography, Optical lithography, Manufacturing, Photomasks, Silicon, Semiconducting wafers

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Proceedings Article | 16 April 2011 Paper

Implementation of KrF DBARCs for implant applications on advanced lithography nodes

Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, Cherry Tang

Proceedings Volume 7972, 797227 (2011) https://doi.org/10.1117/12.879464

KEYWORDS: Picosecond phenomena, Photoresist materials, Lithography, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Polymers, Silicon, Reflectivity, Photomasks

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Proceedings Article | 8 April 2011 Paper

Development of EUV resist for 22nm half pitch and beyond

Kouta Nishino, Ken Maruyama, Tooru Kimura, Toshiyuki Kai, Kentaro Goto, Shalini Sharma

Proceedings Volume 7969, 79692I (2011) https://doi.org/10.1117/12.879430

KEYWORDS: Diffusion, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Line width roughness, Yield improvement, Glasses, Optical lithography, Polymers, Quantum efficiency

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Proceedings Article | 20 March 2010 Paper

Development of EUV resist for 22nm half pitch and beyond

Ken Maruyama, Makoto Shimizu, Yuuki Hirai, Kouta Nishino, Tooru Kimura, Toshiyuki Kai, Kentaro Goto, Shalini Sharma

Proceedings Volume 7636, 76360T (2010) https://doi.org/10.1117/12.846332

KEYWORDS: Diffusion, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Glasses, Lithography, Amplifiers, Photoresist processing, Optical amplifiers, Magnesium

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Proceedings Article | 1 April 2009 Paper

Incorporating organosilanes into EUV photoresists: diphenyltrimethylsilylmethylsulfonium triflate as a new PAG

Shalini Sharma, Yoichi Ogata, Clarion Tung, James Blackwell, Todd Younkin, Yoshi Hishiro, Joshua Figueroa, Arnold Rheingold

Proceedings Volume 7273, 72733N (2009) https://doi.org/10.1117/12.814220

KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Optical transfer functions, Optical lithography, Photoresist materials, Semiconducting wafers, Chemistry, Extreme ultraviolet, Polymers, Lithography

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Proceedings Article | 30 March 2007 Paper

Novel developers for positive tone EUV photoresists

Geeta Sharma, Shalini Sharma, Michael Rattner, Robert Meagley, Masato Tanaka, Tsutomu Shimokawa, Hikaru Sugita, Tina Wang, Atsushi Shiota

Proceedings Volume 6519, 65190P (2007) https://doi.org/10.1117/12.712377

KEYWORDS: Standards development, Photoresist developing, Photoresist materials, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Polymers, Scanning electron microscopy, Semiconducting wafers, Solids

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Proceedings Article | 21 March 2007 Paper

Enhancing photoresist performance with an adhesion promoting photo-acid generator

Shalini Sharma, Robert Meagley

Proceedings Volume 6519, 65190K (2007) https://doi.org/10.1117/12.712359

KEYWORDS: Diffusion, Lithography, Deep ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Silver, Interfaces, Polymers, Ions, Semiconducting wafers

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Showing 5 of 9 publications

Conference Committee Involvement (3)

Photomask Technology

27 September 2021 | Online Only, United States

Photomask Technology

21 September 2020 | Online Only, California, United States

Photomask Technology

16 September 2019 | Monterey, California, United States

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