Dr. Shalini Sharma
Staff R&D Engineer at JSR Micro Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (9)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Optical lithography, Etching, Argon, Silicon, Photoresist materials, Monte Carlo methods, Photomasks, Ion implantation, Wet etching, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Radiation effects, Light, Absorption

Proceedings Article | 8 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Silicon, Diffusion, Manufacturing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Immersion lithography, Semiconducting wafers

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Photoresist materials, Photomasks, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Photoresist developing

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Polymers, Glasses, Diffusion, Quantum efficiency, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Yield improvement

Showing 5 of 9 publications
Conference Committee Involvement (3)
Photomask Technology
26 September 2021 | Monterey, California, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
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