Shang Feng Weng
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481H (2019) https://doi.org/10.1117/12.2537935
KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

Proceedings Article | 27 June 2019 Paper
Proceedings Volume 11178, 111780Q (2019) https://doi.org/10.1117/12.2535770
KEYWORDS: Photomasks, Optical proximity correction, Scanning electron microscopy, Optical calibration, Critical dimension metrology, Optical simulations, Bridges, Etching, Calibration, Wafer-level optics

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