Dr. Shangting F. Detweiler
Process Engineer at Texas Instruments Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Metrology, Optical lithography, Data modeling, Scanners, Scanning electron microscopy, Scatterometry, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Reticles, Lithographic illumination, Scanners, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Metrology, Diffractive optical elements, Etching, Scanners, Scanning electron microscopy, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Signal detection

Proceedings Article | 7 July 1997 Paper
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Optical lithography, Etching, Image processing, Silicon, Coating, Reflectivity, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top