Dr. Shannon B. Hill
Physicist at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Multilayers, Annealing, Silicon, Resistance, Reflectivity, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

Proceedings Article | 13 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Electron beams, Contamination, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Semiconducting wafers, Standards development, Temperature metrology

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Molecules, Manufacturing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Contamination, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Beam shaping, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 26 March 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Semiconducting wafers

Showing 5 of 15 publications
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