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Sharon Aharon
R&D engineer at KLA Israel
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Publications (3)
Proceedings Article | 26 May 2022 Poster + Paper
Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits
Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981
KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment
Proceedings Article | 13 March 2018 Paper
Accuracy optimization with wavelength tunability in overlay imaging technology
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim, Minhyung Hong, Seungyoung Kim, Jieun Lee, Dongyoung Lee, Eungryong Oh, Ahlin Choi, Youngsik Kim, Tal Marciano, Dana Klein, Eitan Hajaj, Sharon Aharon , Guy Ben-Dov , Saltoun Lilach, Dan Serero, Anna Golotsvan
Proceedings Volume 10585, 1058532 (2018) https://doi.org/10.1117/12.2300153
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction, Light sources, Imaging technologies, Integrated circuits, Visible radiation, Optical testing, Electromagnetism, Signal processing
Proceedings Article | 28 March 2017 Paper
Impact of stochastic process variations on overlay mark fidelity "towards the 5nm node"
Proceedings Volume 10145, 1014509 (2017) https://doi.org/10.1117/12.2258353
KEYWORDS: Overlay metrology, Line edge roughness, Lithography, Stochastic processes, Process control, Manufacturing, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Line width roughness, Extreme ultraviolet lithography, Image segmentation, Scanning electron microscopy
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