Ms. Sheeba J. Panayil Profile

Sheeba J. Panayil

Sales Representative at Applied Materials Inc

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 2 May 2008 Paper

Overcoming mask etch challenges for 45 nm and beyond

M. Chandrachood, T. Y. Leung, K. Yu, M. Grimbergen, S. Panayil, I. Ibrahim, A. Sabharwal, A. Kumar

Proceedings Volume 6792, 67920S (2008) https://doi.org/10.1117/12.798810

KEYWORDS: Etching, Photomasks, Chromium, Infrared search and track, Critical dimension metrology, Reactive ion etching, Optical proximity correction, Ions, Particles, Quartz

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Overcoming loading challenges in a mask etcher for 45 nm and beyond

M. Chandrachood, T. Y. Leung, K. Yu, M. Grimbergen, S. Panayil, I. Ibrahim, A. Sabharwal, A. Kumar

Proceedings Volume 6730, 673046 (2007) https://doi.org/10.1117/12.763351

KEYWORDS: Etching, Photomasks, Chromium, Infrared search and track, Critical dimension metrology, Reactive ion etching, Optical proximity correction, Ions, Particles, Quartz

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Chrome etch solutions for 45-nm and beyond

M. Chandrachood, M. Grimbergen, I. Ibrahim, S. Panayil, A. Kumar

Proceedings Volume 6349, 634933 (2006) https://doi.org/10.1117/12.687565

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Resolution enhancement technologies, Optical proximity correction, Particles, Photoresist processing, Metrology, Infrared search and track

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Quartz etch solutions for 45-nm phase-shift masks

M. Chandrachood, M. Grimbergen, T. Y. B. Leung, S. Panayil, I. Ibrahim, A. Kumar

Proceedings Volume 6349, 634934 (2006) https://doi.org/10.1117/12.687572

KEYWORDS: Etching, Photomasks, Reactive ion etching, Quartz, Ions, Lithography, Resolution enhancement technologies, Photoresist processing, Phase shifts, Semiconducting wafers

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Mask etcher data strategy for 45 nm and beyond

Richard Lewington, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar, John Yamartino

Proceedings Volume 6283, 62831W (2006) https://doi.org/10.1117/12.681760

KEYWORDS: Sensors, Etching, Data acquisition, Photomasks, Principal component analysis, Data mining, Statistical analysis, Interfaces, Zoom lenses, Process control

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Chrome etch challenges for 45 nm and beyond

Madhavi Chandrachood, Michael Grimbergen, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62831V (2006) https://doi.org/10.1117/12.681759

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Resolution enhancement technologies, Optical proximity correction, Photoresist processing, Particles, Plasma etching, Metrology

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Quartz etch challenges for 45 nm phase-shift masks

Scott Anderson, Madhavi Chandrachood, Michael Grimbergen, Toi Yue Becky Leung, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62831X (2006) https://doi.org/10.1117/12.681761

KEYWORDS: Etching, Photomasks, Reactive ion etching, Quartz, Lithography, Resolution enhancement technologies, Ions, Polymers, Semiconducting wafers, Phase shifts

Read Abstract +

Proceedings Article | 19 May 2006 Paper

Photomask etch challenges for future technology nodes

Madhavi Chandrachood, Michael Grimbergen, Toi Yue Leung, Keven Yu, Renee Koch, Jeff Chen, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62830C (2006) https://doi.org/10.1117/12.684417

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Reactive ion etching, Resolution enhancement technologies, Quartz, Control systems, Plasma etching, Phase shifts

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years