Sheldon Meyers
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 22 January 2018 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Monochromatic aberrations, Reticles, Optical lithography, Calibration, Scanners, Software development, Semiconducting wafers, Current controlled current source

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Metrology, Imaging systems, Scanners, Error analysis, Control systems, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Systems modeling, Overlay metrology

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Computational modeling, Calibration, Wavefronts, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Reticles, Scanners, Ions, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Semiconducting wafers, Defect inspection

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

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