Mr. Shengyuan Zhong Profile

Shengyuan Zhong

at KLA China

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 26 May 2022 Presentation + Paper

A novel methodology for wafer-level scanner focus spot capture and back-tracing mechanism

Chieh-Chen Chiu, Mingqi Gao, Feng Tian, Wei Feng, Andy Lan, Dan Li, Shengyuan Zhong, Aijiao Zhu, Ningqi Zhu, Yunchen Xu, Jin Zhu, Jincheng Pei, Kevin Huang

Proceedings Volume 12053, 120530U (2022) https://doi.org/10.1117/12.2627284

KEYWORDS: Semiconducting wafers, Contamination, Scanners, Data processing, Statistical analysis, Detection and tracking algorithms, Optical lithography, Lithography, Data analysis

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

A new development algorithm to optimize scanner alignment sampling for cross-chuck overlay performance optimization

Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Chao-Jen Tsou, Shengyuan Zhong, Norman Birnstein, Robin Maximilian Zech, Clemens Utzny, Jin Zhu, Jincheng Pei, Kevin Huang

Proceedings Volume 12053, 1205329 (2022) https://doi.org/10.1117/12.2627283

KEYWORDS: Optical alignment, Optimization (mathematics), Scanners, Semiconducting wafers, Overlay metrology, Data modeling, Performance modeling, Semiconductors

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

A comprehensive study of scanner alignment mark quantity and layout-dependent effect for overlay performance optimization

Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Shengyuan Zhong, Chao-jen Tsou, Ningqi Zhu, Jin Zhu, Jincheng Pei, Kevin Huang

Proceedings Volume 12053, 1205319 (2022) https://doi.org/10.1117/12.2614375

KEYWORDS: Optical alignment, Semiconducting wafers, Scanners, Overlay metrology, Optimization (mathematics), Computer simulations, Performance modeling, Device simulation, Data modeling

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Proceedings Article | 22 February 2021 Presentation + Paper

Novel methods for stitching and overlay corrections

Haifeng Pu, Ningqi Zhu, Shengyuan Zhong, Jason Pei, Chin-Chou K. Huang, Qi Cheng, Lifeng Tong, Chuanlong Wang, Jian Wang, Hongbo He

Proceedings Volume 11611, 116111I (2021) https://doi.org/10.1117/12.2583787

KEYWORDS: Overlay metrology, Process control, Metrology, CMOS sensors, Semiconductor process technologies, Reticles, Optical parametric oscillators, Optical lithography, Optical alignment, Lithography

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