Shinyoung Kim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Diffraction, Metrology, Optical lithography, Error analysis, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Defect detection, Databases, Etching, Inspection, Control systems, Distortion, Optical testing, Overlay metrology, Chemical mechanical planarization, Defect inspection

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Calibration, Manufacturing, 3D modeling, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Atrial fibrillation, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

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