Mr. Shinji Kunitani Profile

Shinji Kunitani

at Toppan Printing Co Ltd

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Author

Publications (6)

Proceedings Article | 28 July 2014 Paper

In-die registration measurement using novel model-based approach for advanced technology masks

Shunsuke Sato, Frank Laske, Shinji Kunitani, Tatsuhiko Kamibayashi, Akira Fuse, Naoki Takahashi, Klaus-Dieter Roeth, Slawomir Czerkas, Mehdi Daneshpanah, Yoshinori Nagaoka

Proceedings Volume 9256, 92560E (2014) https://doi.org/10.1117/12.2070399

KEYWORDS: Photomasks, Image registration, Model-based design, Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Semiconductors, Data processing, Metals

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Proceedings Article | 16 September 2013 Paper

In-die mask registration for multi-patterning

F. Laske, S. Kunitani, T. Kamibayashi, M. Yamana, A. Fuse, M. Wagner, K.-D. Roeth, M. Ferber, M. Daneshpanah, S. Czerkas, H. Sakaguchi

Proceedings Volume 8880, 888024 (2013) https://doi.org/10.1117/12.2027200

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Reticles, Image registration, Overlay metrology, Model-based design, Manufacturing, Lithography, Error analysis

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Proceedings Article | 17 October 2008 Paper

Layout driven DNIR

Kiyoshi Kageyama, Kohei Yanagisawa, Atsushi Kobayashi, Shinji Kunitani, Yoji Tonooka

Proceedings Volume 7122, 71223H (2008) https://doi.org/10.1117/12.801940

KEYWORDS: Inspection, Photomasks, Manufacturing, Optical proximity correction, Scattering, Neodymium, Printing, Carbon monoxide, Semiconductors, Photomask technology

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Proceedings Article | 19 May 2008 Paper

The study of defect inspection with die to model based on aerial image

Shinji Kunitani, Atsushi Kobayashi, Susumu Nagashige

Proceedings Volume 7028, 70282R (2008) https://doi.org/10.1117/12.793097

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect inspection, Immersion lithography, Defect detection, Optical proximity correction, Quantum chromodynamics, Databases, Design for manufacturing

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Proceedings Article | 23 March 2006 Paper

Advanced Image Placement Performance for the Current EPL Masks

Hideyuki Eguchi, Hiroshi Sugimura, Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Kentaro Ogawa, Takashi Susa, Shinji Kunitani, Toshiaki Kurosu, Takashi Yoshii, Kojiro Itoh, Akira Tamura

Proceedings Volume 6151, 61511G (2006) https://doi.org/10.1117/12.655423

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching

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Proceedings Article | 28 June 2005 Paper

Defect inspection strategy of LEEPL masks

Isao Yonekura, Shinji Kunitani, Takashi Susa, Kojiro Itoh, Akira Tamura, Satoru Maruyama

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617292

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Inspection, Defect inspection, Printing, Defect detection, Scanning electron microscopy, Image quality, Electron beams

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Showing 5 of 6 publications

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