Dr. Shinji Omori
at Sony Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 6 May 2005 Paper
S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733
KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

Proceedings Article | 20 August 2004 Paper
Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822
KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

Proceedings Article | 20 August 2004 Paper
Shinji Omori, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Takashi Susa, Kenta Yotsui, Kojiro Itoh, Akira Tamura
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557821
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Metrology, Lithography, Distortion, Scanners, Data corrections, Electron beams, Data processing

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557776
KEYWORDS: Data processing, Photomasks, Chemical elements, Error analysis, Finite element methods, Electron beam lithography, Distortion, Lithography, Computer simulations, Image processing

SPIE Journal Paper | 1 July 2004
Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa
JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535104
KEYWORDS: Lithography, Photomasks, Semiconducting wafers, Charged-particle lithography, Lithographic illumination, Phase shifts, Optical lithography, Electroluminescence, Photoresist processing, Critical dimension metrology

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423
KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

Proceedings Article | 17 December 2003 Paper
Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067
KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Optical alignment, Distortion, Overlay metrology, Resolution enhancement technologies, Silicon carbide, Cadmium sulfide

Proceedings Article | 28 August 2003 Paper
Kohichi Nakayama, Kazuharu Inoue, Isao Ashida, Shinji Omori, Hidetoshi Ohnuma
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504071
KEYWORDS: Photomasks, Finite element methods, Charged-particle lithography, Lithography, Semiconducting wafers, Liquids, Algorithm development, Silicon, Safety, Semiconductors

Proceedings Article | 28 August 2003 Paper
Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258
KEYWORDS: Photomasks, Semiconducting wafers, Contamination, Critical dimension metrology, Lithography, Metrology, Distortion, Overlay metrology, Charged-particle lithography, Silicon

Proceedings Article | 28 August 2003 Paper
Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273
KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Etching, Image enhancement, Scanning electron microscopy, Line edge roughness, Lithography, Photoresist processing, Defect inspection

Proceedings Article | 1 August 2002 Paper
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477009
KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Projection lithography, Electron beam lithography, Finite element methods, Lithography, Electron beams, Diamond, Computer simulations

Proceedings Article | 1 August 2002 Paper
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476997
KEYWORDS: Photomasks, Charged-particle lithography, Chemical elements, Data processing, Lithography, Distortion, Finite element methods, Image processing, Optical lithography, Data conversion

Showing 5 of 14 publications
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