Shinya Kikugawa
Director at AGC Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Multilayers, Polishing, Glasses, Particles, Coating, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Silica, Quartz, Glasses, Silicon, Chemistry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chlorine, Tin

Proceedings Article | 2 June 2004 Paper
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Polymers, Distortion, Pellicles, Refraction, Fluorine, Semiconducting wafers, Overlay metrology, Polymer thin films

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Antireflective coatings, Reticles, Silica, Birefringence, Polymers, Glasses, Laser irradiation, Pellicles, Photomasks

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Reticles, Silica, Interferometers, Quartz, Glasses, Pellicles, Refraction, Photomasks, Aluminum

Showing 5 of 10 publications
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