Mr. Shunsuke Mizutani Profile

Shunsuke Mizutani

at Hitachi High-Tech Corp

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 April 2023 Presentation + Paper

High repeatability and low shrinkage solution using CD-SEM for EUV resist

Masaki Sugie, Toshimasa Kameda, Shunsuke Mizutani

Proceedings Volume 12496, 1249615 (2023) https://doi.org/10.1117/12.2657680

KEYWORDS: Shrinkage, Extreme ultraviolet, Semiconducting wafers, Image quality, Electron beams, Extreme ultraviolet lithography, Signal intensity, Semiconductors

Read Abstract +

SPIE Journal Paper | 18 September 2019

CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

JM3, Vol. 18, Issue 03, 034004, (September 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.3.034004

SPIE Journal Paper | 6 April 2019

Influence of e-beam aperture angle on critical dimensions-scanning electron microscopes measurements for high aspect ratio structure

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Uki Ikeda, Shunsuke Mizutani, Kouichi Kurosawa, Hajime Kawano

JM3, Vol. 18, Issue 02, 021204, (April 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.021204

KEYWORDS: Critical dimension metrology, Monte Carlo methods, Electron microscopes, Scanning electron microscopy, Cadmium, Edge detection, Silicon, Optical simulations, Metrology, Inspection

Read Abstract +

Proceedings Article | 26 March 2019 Paper

High-resolution low-shrinkage CD metrology for EUV resist using high voltage CD-SEM

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

Proceedings Volume 10959, 109591D (2019) https://doi.org/10.1117/12.2514797

KEYWORDS: Extreme ultraviolet, Monte Carlo methods, Critical dimension metrology, Line edge roughness, Electrons, Spatial resolution, Extreme ultraviolet lithography, Metrology, Scanning electron microscopy

Read Abstract +

Proceedings Article | 13 March 2018 Paper

Influence of e-beam aperture angle on CD-SEM measurements for high-aspect ratio structure

Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki, Uki Ikeda, Shunsuke Mizutani, Kouichi Kurosawa, Hajime Kawano

Proceedings Volume 10585, 105851A (2018) https://doi.org/10.1117/12.2296756

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Cadmium, Silicon, Critical dimension metrology, Spatial resolution, Optical simulations, 3D metrology, Semiconductors, Laser scattering

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years