Dr. Shuo-Yen Chou Profile

Dr. Shuo-Yen Chou

Deputy Director at Taiwan Semiconductor Manufacturing Co Ltd

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Publications (4)

Proceedings Article | 19 March 2018 Paper

Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Chun-Hung Liu, Shih-Ming Chang, Chia-Hua Chang, Wen Lo, Hsin-Wei Wu, Chien-Cheng Chen, Alex Chen, Shuo-Yen Chou, Ru-Gun Liu

Proceedings Volume 10584, 105841E (2018) https://doi.org/10.1117/12.2302685

KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

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Proceedings Article | 15 March 2016 Paper

Inverse polarizer on immersion lithography mask

Minfeng Chen, Shuo-Yen Chou, Chun-Kuang Chen, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9780, 97801R (2016) https://doi.org/10.1117/12.2225127

KEYWORDS: Diffraction, Photomasks, Polarizers, Dielectric polarization, Image quality, Polarization, Transmittance, Immersion lithography, Lithography, Diffraction gratings

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Proceedings Article | 12 April 2013 Paper

Interference harmonics and rigorous EM spectrum analysis method for low-k1 CD Bossung tilt correction

Shuo-Yen Chou, Hoi-Tou Ng, Yi-Yin Chen, Chien-Fu Lee, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 8683, 868315 (2013) https://doi.org/10.1117/12.2010599

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Diffraction, Reflectivity, Polarization, Spectrum analysis, Control systems, Critical dimension metrology, Resolution enhancement technologies

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Proceedings Article | 20 August 2004 Paper

Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Shuo-Yen Chou, Jaw-Jung Shin, King-Chang Shu, Jan-Wen You, Lin-Hung Shiu, Bin-Chang Chang, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557745

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Laser energy, Image processing, Electron beam lithography, Semiconducting wafers, Optical simulations, Optical proximity correction, Convolution

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