Mr. Shuuichi Nishikido Profile

Shuuichi Nishikido

at Tokyo Electron Kyushu Ltd

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Author

Publications (2)

Proceedings Article | 31 March 2010 Paper

Productivity improvement in the wafer bevel and backside cleaning before exposure

Yoichi Tokunaga, Shuuichi Nishikido, Kousuke Yoshihara, Zoe Hong, Marlene Strobl, Yu Lin

Proceedings Volume 7639, 763924 (2010) https://doi.org/10.1117/12.846488

KEYWORDS: Semiconducting wafers, Particles, Photoresist processing, Contamination, Image processing, Immersion lithography, Coating, Thin film coatings, Optical lithography, Head-mounted displays

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Proceedings Article | 1 April 2009 Paper

Productivity improvement in the wafer backside cleaning before exposure

S. Nishikido, T. Kitano, Y. Tokunaga, Marlene Strobl, Yu Chen Lin

Proceedings Volume 7273, 72730V (2009) https://doi.org/10.1117/12.814021

KEYWORDS: Semiconducting wafers, Particles, Optical lithography, Contamination, Inspection, Defect detection, Current controlled current source, Manufacturing, Coating, Sensors

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