Mr. Shyi-Long Shy Profile

Shyi-Long Shy

Retired

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 19 March 2018 Paper

Contact/proximity stepper using UVA, UVB, and UVC light sources

Shyi-Long Shy

Proceedings Volume 10584, 1058413 (2018) https://doi.org/10.1117/12.2292953

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Proceedings Article | 21 March 2017 Paper

Inspection and fabrication of nano-imprint stamp using electron and ion dual beam system

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 10144, 1014413 (2017) https://doi.org/10.1117/12.2257398

KEYWORDS: Photomasks, Electron beam lithography, Etching, Metals, Dielectrics, Inspection, Ions, Electron beams

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Proceedings Article | 1 April 2016 Paper

Nano-imprint lithography using poly (methyl methacrylate) (PMMA) and polystyrene (PS) polymers

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 9777, 97771H (2016) https://doi.org/10.1117/12.2218594

KEYWORDS: Polymethylmethacrylate, Polymers, Nanoimprint lithography, Picosecond phenomena, Lithography, Electron beam lithography, Coating, Glasses, Electron beams, Printing

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Proceedings Article | 19 March 2015 Paper

Negative e-beam resists using for nano-imprint lithography and silicone mold fabrication

S. Shy, Anil Kumar T.V., Gene Sheu, Shao-Ming Yang, M. Chen, C. Hong

Proceedings Volume 9423, 94231M (2015) https://doi.org/10.1117/12.2075381

KEYWORDS: Lithography, Electron beam lithography, Polymers, Silicon, Nanoimprint lithography, Coating, Resistance, Photoresist processing, Electron beams, Printing

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Proceedings Article | 31 March 2014 Paper

Novel wafer stepper with violet LED light source

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 9052, 90522G (2014) https://doi.org/10.1117/12.2045738

KEYWORDS: Semiconducting wafers, Light emitting diodes, Light sources, Photomasks, Lithography, Photoresist materials, Printing, Lamps, Microelectromechanical systems, Mercury

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Proceedings Article | 21 March 2012 Paper

Fabrication nanopillars pattern on PDMS using anodic aluminum oxide film as template

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 8323, 83232H (2012) https://doi.org/10.1117/12.916456

KEYWORDS: Aluminum, Scanning electron microscopy, Optoelectronic devices, Lithography, Nanolithography, Nanostructures, Image processing, Photomicroscopy, Semiconductors, Field emission displays

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Proceedings Article | 19 March 2012 Paper

Gray-level 3D resist process and its application

Yung-Chiang Ting, Shyi-Long Shy, Andy Liu, Cheng-San Wu, C. Chen

Proceedings Volume 8325, 83252E (2012) https://doi.org/10.1117/12.915702

KEYWORDS: Photoresist processing, Fresnel lenses, Electron beams, Optical alignment, Semiconducting wafers, LCDs, Electron beam lithography, Coating, Prisms, Solar concentrators

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Proceedings Article | 1 March 2011 Paper

Synthesis of well-aligned and highly density nanopore arrays with the assistance of ultrasonic

Yung-Chiang Ting, Shyi-Long Shy, Chung-An Wang

Proceedings Volume 7947, 79470X (2011) https://doi.org/10.1117/12.873123

KEYWORDS: Ultrasonics, Aluminum, Oxides, Scanning electron microscopy, Image processing, Interfaces, Atomic force microscopy, Metals, Nanostructures, Nanolithography

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Proceedings Article | 14 December 2009 Paper

Green binary and phase shifting mask

S. Shy, Chao-Sin Hong, Cheng-San Wu, S. Chen, Hung-Yu Wu, Yung-Chiang Ting

Proceedings Volume 7520, 75202D (2009) https://doi.org/10.1117/12.836228

KEYWORDS: Photomasks, Binary data, Silicon, Chromium, Image analysis, Lithography, Thin films, Electron beam lithography, Phase shifting, Nickel

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Proceedings Article | 20 May 2006 Paper

Fabrication of nanoimprint stamp and its application

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 6283, 62833H (2006) https://doi.org/10.1117/12.681836

KEYWORDS: Nanoimprint lithography, Nanotechnology, Electron beams, Nanolithography, Electron beam lithography, Polymers, Data storage, Microfluidics, Semiconductors, Biotechnology

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Proceedings Article | 20 May 2006 Paper

Pore size control of alumina membrane mask

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 6283, 62833I (2006) https://doi.org/10.1117/12.681837

KEYWORDS: Etching, Aluminum, Photomasks, Image processing, Scanning electron microscopy, Oxides, Wet etching, Nanostructures, Oxidation, Nanowires

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Proceedings Article | 20 August 2004 Paper

Nanofabrication of nanopattern and microdevices using contact/proximity lithography

Yung-Chiang Ting, Shyi-Long Shy, Ming-Chun Lee, Bau-Tong Dai

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557750

KEYWORDS: Photomasks, Lithography, Chromium, Etching, Wet etching, Glasses, Nanofabrication, Light sources, Printing, Submicron lithography

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Proceedings Article | 27 December 1996 Paper

Application of direct-write electron-beam lithography for deep-submicron fabrication

Shyi-Long Shy, Jen Yew, Kazumitsu Nakamura, Chun-Yen Chang

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262816

KEYWORDS: Etching, Plasma, Electron beam lithography, Oxides, Semiconducting wafers, Plasma etching, Lithography, Silicon, Photomasks, Wafer-level optics

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Proceedings Article | 27 December 1996 Paper

Conducting poly(aniline-co-N-propanesulfonic acid aniline) (PAPSAH) as charge dissipation layer for e-beam lithography

Shyi-Long Shy, T. Chao, Tan Lei, Shaw-An Chen, Wen-An Loong, Chun-Yen Chang

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262831

KEYWORDS: Electron beam lithography, Oxides, Lithography, Etching, Electron beams, Semiconducting wafers, Optical lithography, CMOS devices, Quartz, Optical alignment

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Proceedings Article | 7 June 1996 Paper

TiSix as a new embedded material for attenuated phase-shift mask

Wen-An Loong, Tzu-ching Chen, Shyi-Long Shy, Jin-chi Tseng, Ren-Jang Lin

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240969

KEYWORDS: Refractive index, Phase shifts, Transmittance, Sputter deposition, Argon, Silicon, Quartz, Thin films, Ions, Reflection

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Proceedings Article | 8 December 1995 Paper

Mix-and-match lithography technology on 6-in. wafers for nanofabrication

Shyi-Long Shy, Tien Chao, C. Chu, Tan Lei, Kazumitsu Nakamura, Wen-An Loong, Chun-Yen Chang

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228194

KEYWORDS: Lithography, Semiconducting wafers, Electron beam lithography, Nanofabrication, Photoresist processing, Tantalum, Roads, Nanolithography, Chemically amplified resists, Control systems

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Proceedings Article | 8 December 1995 Paper

Powerful inspection and metrology tool for micro- and nanofabrication

Shyi-Long Shy, Tan Lei, Kazumitsu Nakamura, Wen-An Loong, Chun-Yen Chang

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228195

KEYWORDS: Inspection, Metrology, Quantum dots, Photomasks, Nanofabrication, Chromium, Atomic force microscopy, Electron beam lithography, Gallium arsenide, Scanning electron microscopy

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Proceedings Article | 26 May 1995 Paper

Simulation study of a new phase-shifting mask: halftone-rim

Wen-An Loong, Chin-hwa Yeh, Shyi-Long Shy

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209275

KEYWORDS: Halftones, Photomasks, Optical lithography, Phase shifts, Quartz, Chromium, Transmittance, Refractive index, Lithographic illumination, Photoresist materials

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Proceedings Article | 13 May 1994 Paper

Very simple data processing system for deep submicron nanofabrication

Shyi-Long Shy, Tan Lei, C. Chu, Chun-Yen Chang, Sia Lee, Wen-An Loong

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175815

KEYWORDS: Data processing, Photomasks, Computing systems, Inspection, Nanofabrication, Chromium, Scanning electron microscopy, Lithography, Semiconducting wafers, Telecommunications

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Proceedings Article | 15 February 1994 Paper

Simulation and fabrication of a new phase-shifting mask for 0.35 um contact hole pattern transfer: half-tone rim

Wen-An Loong, Shyi-Long Shy, Guei-chi Guo, Y. Chou

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167280

KEYWORDS: Photomasks, Halftones, Transmittance, Reactive ion etching, Photomask technology, Phase shifting, Device simulation, Phase shifts, Etching, Wet etching

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Showing 5 of 20 publications

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