Si-Yeul Yoon
at Photronics Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Thin films, Electron beams, Backscatter, Etching, Dry etching, Equipment and services, Chromium, Photomasks, Mask making, Critical dimension metrology

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Phase shifting, Etching, Glasses, Particles, Chemistry, Chromium, Photomasks, Semiconducting wafers, Liquids, Phase shifts

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Phase shifting, Etching, Quartz, Dry etching, Silicon, Surface roughness, Scanning electron microscopy, Photomasks, Plasma, Phase shifts

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Etching, Gases, Surface roughness, Scanning electron microscopy, Photomasks, Plasma etching, Chlorine, Anisotropic etching, Plasma, Phase shifts

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Phase shifting, Cadmium, Deep ultraviolet, Etching, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 7 publications
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