Mr. Sia Kim Tan Profile

Sia Kim Tan

at GLOBALFOUNDRIES

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 14 October 2011 Paper

Reticle process monitoring and qualification based on reticle CDU and wafer CDU correlation

Guoxiang Ning, Byoung Il Choi, Christian Holfeld, Yee Ta Ngow, Sia Kim Tan, Anna Tchikoulaeva, Fang Hong Gn

Proceedings Volume 8166, 81662N (2011) https://doi.org/10.1117/12.898801

KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Metals, Etching, Photomasks, Multilayers, 3D metrology, Scanners, Metrology

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Proceedings Article | 2 April 2010 Paper

Preliminary results for photomask haze mitigation in a fab environment

Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Michael Archuletta, David Lee

Proceedings Volume 7638, 763817 (2010) https://doi.org/10.1117/12.848283

KEYWORDS: Photomasks, Air contamination, Semiconducting wafers, Reticles, Inspection, Pellicles, Contamination, Manufacturing, Deep ultraviolet, Critical dimension metrology

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Proceedings Article | 4 March 2010 Paper

Radial segmentation approach for contact hole patterning in 193 nm immersion lithography

Moh Lung Ling, Gek Soon Chua, Sia Kim Tan, Cho Jui Tay, Chenggen Quan, Qunying Lin

Proceedings Volume 7640, 76402M (2010) https://doi.org/10.1117/12.848431

KEYWORDS: Optical lithography, Nanoimprint lithography, Image segmentation, Optical proximity correction, Photomasks, Immersion lithography, Image enhancement, Printing, Diffraction, SRAF

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Proceedings Article | 4 March 2010 Paper

Intra field CD uniformity correction by Scanner Dose MapperTM using Galileo® mask transmission mapping as the CDU data source

Gek Soon Chua, Chason Eran, Sia Kim Tan, Byoung IL Choi, Teng Hwee Ng, Poh Ling Lua, Ofir Sharoni, Guy Ben-Zvi

Proceedings Volume 7640, 76402U (2010) https://doi.org/10.1117/12.852819

KEYWORDS: Scanners, Semiconducting wafers, Reticles, Critical dimension metrology, Photomasks, Databases, Calibration, Associative arrays, Data conversion, Printing

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SPIE Journal Paper | 1 December 2008

Modeling of subwavelength resist grating features fabricated by evanescent waves interference

Vadakke Matham Murukeshan, Jeun Kee Chua, Sia Kim Tan, Qunying Lin

OE, Vol. 47, Issue 12, 129001, (December 2008) https://doi.org/10.1117/12.10.1117/1.3041735

KEYWORDS: Photoresist materials, Lithography, Refractive index, Photoresist developing, Optical engineering, Interfaces, Computer simulations, 3D modeling, Prisms, Picture Archiving and Communication System

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Proceedings Article | 25 October 2007 Paper

Progressive growth and hard defect disposition integrated system for 65nm and 45nm ArF immersion lithography

Gek Soon Chua, Sia Kim Tan, Byoung Il Choi, Oi Yin Lee, Jeong Soo Kim

Proceedings Volume 6730, 673027 (2007) https://doi.org/10.1117/12.746622

KEYWORDS: Photomasks, Air contamination, Semiconducting wafers, Inspection, Critical dimension metrology, Lithography, Opacity, System integration, Immersion lithography, Scanners

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Proceedings Article | 26 June 2003 Paper

Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography

Sia-Kim Tan, Qunying Lin, Liang Choo Hsia, Shi-Chung Sun

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485455

KEYWORDS: Photomasks, Source mask optimization, 193nm lithography, Optical lithography, Phase shifts, Lithography, Semiconducting wafers, Diffraction, Critical dimension metrology, Mask making

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Proceedings Article | 30 July 2002 Paper

Impact of transmission error for attenuated phase-shift mask for 0.10-um technology

Sia-Kim Tan, Qunying Lin, Chenggen Quan, Cho Tay

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474485

KEYWORDS: Photomasks, Image transmission, Critical dimension metrology, Phase shifts, Resolution enhancement technologies, Semiconducting wafers, Printing, Light sources, Reticles, Lithographic illumination

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Proceedings Article | 30 July 2002 Paper

MEF studies for attenuated phase-shift mask for sub-0.13-um technology using 248 nm

Sia-Kim Tan, Qunying Lin, Gek Chua, Chenggen Quan, Cho Tay

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474520

KEYWORDS: Photomasks, Atrial fibrillation, Optical lithography, Critical dimension metrology, Semiconducting wafers, Lithography, Resolution enhancement technologies, Optical proximity correction, Reticles, Semiconductor manufacturing

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Proceedings Article | 11 March 2002 Paper

Characterization of assist features on impact of mask error enhancement factors for sub-0.13-um technology

Sia-Kim Tan, Qunying Lin, Cho Tay, Chenggen Quan

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458264

KEYWORDS: Photomasks, Critical dimension metrology, Scattering, Semiconducting wafers, Resolution enhancement technologies, Image enhancement, Reticles, Printing, 193nm lithography, Image processing

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Proceedings Article | 14 September 2001 Paper

Mask error enhancement factor for sub-0.13-um lithography

Sia-Kim Tan, Qunying Lin, Chenggen Quan, Cho Tay, Alex See

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435788

KEYWORDS: Photomasks, Phase shifts, Binary data, Lithography, Transmittance, Scanners, Lithographic illumination, Semiconducting wafers, Critical dimension metrology, Reticles

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Showing 5 of 11 publications

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