Sia Kim Tan
at GLOBALFOUNDRIES
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Reticles, Metrology, Etching, Metals, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Reticles, Contamination, Deep ultraviolet, Air contamination, Manufacturing, Inspection, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Diffraction, Optical lithography, Image segmentation, Printing, Photomasks, Image enhancement, Immersion lithography, Optical proximity correction, SRAF, Nanoimprint lithography

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Calibration, Databases, Scanners, Printing, Photomasks, Associative arrays, Critical dimension metrology, Data conversion, Semiconducting wafers

SPIE Journal Paper | 1 December 2008
OE Vol. 47 Issue 12
KEYWORDS: Photoresist materials, Lithography, Refractive index, Photoresist developing, Optical engineering, Interfaces, Computer simulations, 3D modeling, Prisms, Picture Archiving and Communication System

Showing 5 of 11 publications
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