Dr. Siegfried N. Schwarzl Profile

Dr. Siegfried N. Schwarzl

at Infineon Technologies AG

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 23 March 2006 Paper

Defect printability study using EUV lithography

Adam Pawloski, Siegfried Schwarzl, Frank-Michael Kamm, Karsten Bubke, Falk Lehmann, Andreas Erdmann, Bruno La Fontaine, Thomas Graf, Christian Holfeld

Proceedings Volume 6151, 61510U (2006) https://doi.org/10.1117/12.656386

KEYWORDS: Photomasks, Semiconducting wafers, Printing, Photoresist processing, Extreme ultraviolet lithography, Image processing, Scanning electron microscopy, Extreme ultraviolet, Lithography, Projection systems

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV mask architectures by process window analysis

Klaus Lowack, Siegfried Schwarzl, Stefan Wurm, Markus Bender, Joerg Butschke, Uwe Dersch, Frank-Michael Kamm, Florian Letzkus, Stefan Hirscher, Adam Pawloski, Bruno La Fontaine, Wolf-Dieter Domke, Christian Holfeld

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

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Proceedings Article | 6 December 2004 Paper

Comparative study of mask architectures for EUV lithography

Uwe Dersch, Markus Bender, Siegfried Schwarzl, Patrick Naulleau, Florian Letzkus, Harry Levinson, Klaus Lowack, Christian Holfeld, Adam Pawloski, Joerg Butschke, Stefan Hirscher, Wolf-Dieter Domke, Bruno La Fontaine, Frank-Michael Kamm

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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