Prof. Silvio Teuber
R&D Engineer at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Optical inspection, Printing, Image transmission, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Electron beams, Manufacturing, Inspection, Scanning electron microscopy, Printing, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Glasses, Computer simulations, Printing, Near field, Photomasks, Extreme ultraviolet, Semiconducting wafers, Phase shifts

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

Proceedings Article | 20 October 2005 Paper
Proc. SPIE. 5965, Optical Fabrication, Testing, and Metrology II
KEYWORDS: Lithography, Diffraction, Light sources, Polarization, Computing systems, Transmittance, Photomasks, Vacuum ultraviolet, Spectrophotometry, Resolution enhancement technologies

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top