Sirish Reddy
at Lam Research Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11615, Advanced Etch Technology and Process Integration for Nanopatterning X
KEYWORDS: Oxides, Optical lithography, Etching, Distortion, Photomasks, Data centers

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

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