Mr. Soichi Shida Profile

Soichi Shida

Department Manager at Advantest Corp

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks

Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai

Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660

KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles

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Proceedings Article | 5 October 2023 Paper

Paper

High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545

KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography

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Proceedings Article | 10 May 2016 Paper

Paper

The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information

Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9984, 998407 (2016) https://doi.org/10.1117/12.2242496

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Metrology, Image processing, Statistical analysis, Image quality, Neodymium, Semiconductors, Optical proximity correction

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Proceedings Article | 23 October 2015 Paper

Paper

The capability of lithography simulation based on MVM-SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9635, 96351X (2015) https://doi.org/10.1117/12.2197818

KEYWORDS: Lithography, Photomasks, Scanning electron microscopy, Semiconducting wafers, 3D acquisition, 3D metrology, Defect inspection, Defect detection, Manufacturing, Standards development, Critical dimension metrology, Extreme ultraviolet, Bridges, Image analysis, 193nm lithography

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Proceedings Article | 9 July 2015 Paper

Paper

Study of defect verification based on lithography simulation with a SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9658, 96580V (2015) https://doi.org/10.1117/12.2197617

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Defect inspection, Optical lithography, Signal to noise ratio, Source mask optimization

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Proceedings Article | 28 July 2014 Paper

Paper

Three dimensional profile measurement using multi-channel detector MVM-SEM

Makoto Yoshikawa, Sumito Harada, Keisuke Ito, Tsutomu Murakawa, Soichi Shida, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9256, 92560G (2014) https://doi.org/10.1117/12.2064944

KEYWORDS: 3D metrology, Sensors, Atomic force microscopy, 3D image processing, Scanning electron microscopy, Algorithm development, Photomasks, Metrology, Transmission electron microscopy, Time metrology

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Proceedings Article | 28 July 2014 Paper

Paper

Novel CD-SEM measurement methodology for complex OPCed patterns

Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, Soichi Shida, Takayuki Nakamura

Proceedings Volume 9256, 92560D (2014) https://doi.org/10.1117/12.2069368

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Metrology, Semiconductors, Error analysis, Optical proximity correction, Reliability, Tolerancing, Lithography

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Proceedings Article | 2 April 2014 Paper

Paper

Novel three dimensional (3D) CD-SEM profile measurements

Wataru Ito, Benjamin Bunday, Sumito Harada, Aaron Cordes, Tsutomu Murakawa, Abraham Arceo, Makoto Yoshikawa, Toshihiko Hara, Takehito Arai, Soichi Shida, Masayuki Yamagata, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 9050, 90500D (2014) https://doi.org/10.1117/12.2047374

KEYWORDS: Atomic force microscopy, 3D image processing, 3D metrology, Sensors, Semiconducting wafers, Metrology, Reticles, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 9 September 2013 Paper

Paper

SEM image quality enhancement technology for bright field mask

Naoki Fukuda, Yuta Chihara, Soichi Shida, Keisuke Ito

Proceedings Volume 8880, 88801C (2013) https://doi.org/10.1117/12.2029786

KEYWORDS: Scanning electron microscopy, Photomasks, Optical lithography, Selenium, Line scan image sensors, Metrology, Opacity, Glasses, Sensors, Image quality

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Proceedings Article | 28 June 2013 Paper

Paper

A study of phase defect measurement on EUV mask by multiple detectors CD-SEM

Isao Yonekura, Hidemitsu Hakii, Shinya Morisaki, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8701, 870110 (2013) https://doi.org/10.1117/12.2031846

KEYWORDS: 3D metrology, Sensors, 3D image processing, Atomic force microscopy, 3D vision, 3D acquisition, Extreme ultraviolet, Scanning electron microscopy, Phase measurement, Electron beams

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Proceedings Article | 28 June 2013 Paper

Paper

Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM

Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

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Proceedings Article | 8 November 2012 Paper

Paper

Photomask quality evaluation using lithography simulation and precision SEM image contour data

Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov

Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

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Proceedings Article | 30 June 2012 Paper

Paper

New CDSEM technology and its performance for multiple patterning process

Yuta Chihara, Keisuke Ito, Masayuki Kuribara, Toshimichi Iwai, Soichi Shida, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8441, 844109 (2012) https://doi.org/10.1117/12.964404

KEYWORDS: Scanning electron microscopy, Photomasks, Metrology, Electron beam lithography, Line scan image sensors, Electron beams, Lithography, Semiconductors, Capacitance, Absorption

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Proceedings Article | 19 May 2011 Paper

Paper

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 8081, 80810G (2011) https://doi.org/10.1117/12.899368

KEYWORDS: Sensors, Signal detection, Photomasks, Algorithm development, 3D metrology, Polonium, Metrology, Scanning electron microscopy, Electron beams, Detection and tracking algorithms

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Proceedings Article | 20 April 2011 Paper

Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7971, 797121 (2011) https://doi.org/10.1117/12.879400

KEYWORDS: Sensors, Atomic force microscopy, Signal detection, Photomasks, Etching, 3D metrology, Tantalum, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 17 October 2008 Paper

Paper

A study of the limited area scanning system in the mask CD-SEM

Toshi Iwai, Soichi Shida, Mitsuo Hiroyama, Takayuki Nakamura, Hisaya Sakaguchi, Hiroki Ueno, Masaru Higuchi, Tatsuya Aihara

Proceedings Volume 7122, 71222R (2008) https://doi.org/10.1117/12.801418

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Electron beams, Metrology, Electron microscopes, Process control, OLE for process control, Image resolution, Beam controllers

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Showing 5 of 16 publications

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