CONFERENCE PROCEEDINGS
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Dr. Song Lan
at D2S Inc
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 20 March 2018 Paper
Deep learning assisted fast mask optimization
Song Lan, Jun Liu, Yumin Wang, Ke Zhao, Jiangwei Li
Proceedings Volume 10587, 105870H (2018) https://doi.org/10.1117/12.2297514
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Lithography, Image transmission, Image processing, Logic
Proceedings Article | 31 March 2014 Paper
Wafer sub-layer impact in OPC/ORC models for advanced node implant layers
Proceedings Volume 9052, 90520D (2014) https://doi.org/10.1117/12.2047115
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography
Proceedings Article | 8 November 2012 Paper
A profile-aware resist model with variable threshold
Sylvain Moulis, Vincent Farys, Jérôme Belledent, Romain Thérèse, Song Lan, Qian Zhao, Mu Feng, Laurent Depre, Russell Dover
Proceedings Volume 8522, 85220A (2012) https://doi.org/10.1117/12.966383
KEYWORDS: Scanning electron microscopy, Data modeling, Atomic force microscopy, Calibration, Data centers, 3D modeling, Lithography, Photoresist processing, Double patterning technology, Electron beam lithography
Proceedings Article | 13 March 2012 Paper
A full-chip 3D computational lithography framework
Peng Liu, Zhengfan Zhang, Song Lan, Qian Zhao, Mu Feng, Hua-yu Liu, Venu Vellanki, Yen-wen Lu
Proceedings Volume 8326, 83260A (2012) https://doi.org/10.1117/12.916076
KEYWORDS: 3D modeling, Photomasks, Semiconducting wafers, Performance modeling, Diffusion, Lithography, Data modeling, Optical proximity correction, 3D image processing, Computer simulations
Proceedings Article | 13 March 2012 Paper
Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects
Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon
Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000
KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection
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