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Songyi Park
at SAMSUNG Electronics Co Ltd
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Author
Publications (2)
Proceedings Article | 13 March 2012 Paper
Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects
Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon
Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000
KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection
Proceedings Article | 5 April 2007 Paper
Ellipsometric studies of the absorption of liquid by photo resist
Hee Jeong, Jaesun Kyung, Songyi Park, Kiyong Lee, Hyungjoo Lee, Hyuknyeong Cheon, Ilsin An, Sook Lee
Proceedings Volume 6518, 651849 (2007) https://doi.org/10.1117/12.710811
KEYWORDS: Water, Ellipsometry, Liquids, Absorption, Refractive index, Spectroscopic ellipsometry, Ultraviolet radiation, Immersion lithography, Imaging systems, Optical properties
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