Sook Lee
Mask Topography Effect at Rohm and Haas Electronic Materials, LLC
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 10 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Metals, Reflectivity, Control systems, Line width roughness, Logic devices, Tin

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Ellipsometry, Refractive index, Optical properties, Imaging systems, Water, Ultraviolet radiation, Spectroscopic ellipsometry, Immersion lithography, Liquids, Absorption

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Data modeling, Calibration, Scanners, Chromium, Computer simulations, Photomasks, Optical proximity correction, Virtual reality, Binary data

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Diffraction, Polarization, 3D modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers, 3D image processing, Instrument modeling

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Polarization, Chromium, 3D modeling, Near field, Transmittance, Photomasks, Optical proximity correction, Critical dimension metrology, Binary data

Showing 5 of 14 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top