KEYWORDS: Picture Archiving and Communication System, Video, Human-machine interfaces, Control systems, Optical lithography, Process control, Artificial intelligence, Local area networks, Inspection, Photography
This paper describes an expert system that assists photolithography inspectors during IC fabrication process. Strict control of the process line is required, lack of control often results in costly errors. In photolithography, flaws that occur during the IC patterning process should be correctable within the same step. The diagnosis and trouble shooting of these flaws are done using the Photolith Analysis and Control (PAC). It is assumed that the readers have a good knowledge of IC processing and are familiar with the technical terminology prevalent in the field. The paper is arranged as follows, section 2 described the chief motivating factors for PAC. This is followed by a description of the user and video interfaces in section 3. Section 4 describes the PAC system in detail, section 5 contains performance and evaluation data and is followed by a conclusion.
A flexible interface to an expert system shell called CLIPS is described in this paper. The advantages of such an interface are that it provides assistance to the knowledge engineer in all phases of the life cycle of expert system development. In other words, it facilitates the task of knowledge acquisition, knowledge refinement, knowledgebase(s) addition/modification, knowledgebase maintenance, and information management relating to specific expert system projects.
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