Staf Verhaegen
Project Engineer ASIC Design at imec
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet lithography, Optical proximity correction, Extreme ultraviolet, Lithography, Critical dimension metrology, Photomasks, Semiconducting wafers

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination

Proceedings Article | 11 March 2010 Paper
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Logic, Lithography, Optical lithography, Double patterning technology, Electroluminescence, Fiber optic illuminators, Transistors, Photomasks, Source mask optimization, Lithium

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Diffractive optical elements, Manufacturing, Double patterning technology, Scanners, Electroluminescence, Fiber optic illuminators, Optical lithography

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Double patterning technology, Thin film coatings, Optical lithography, Logic, Semiconducting wafers, Electroluminescence, Image processing, Line width roughness, Printing, Surface plasmons

Showing 5 of 26 publications
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