Stefan O. Pelekies
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 October 2010 Paper
S. Pelekies, T. Schuhmann, W. Gardner, A. Camacho, J. Protz
Proceedings Volume 7833, 783306 (2010) https://doi.org/10.1117/12.862729
KEYWORDS: Oxides, Semiconducting wafers, Etching, Optical alignment, Deep reactive ion etching, Microelectromechanical systems, Silicon, Plasma enhanced chemical vapor deposition, Wafer bonding, Photomasks

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