Dr. Steffen F. Schulze Profile

Dr. Steffen F. Schulze

VP Product Management at Siemens EDA

SPIE Involvement:

Author

Publications (44)

Proceedings Article | 3 October 2018 Presentation + Paper

Advanced jog handling techniques in MPC for better QoR

Bhardwaj Durvasula, Ingo Bork, Peter Buck, Archana Rajagopalan, Nageswara Rao, Murali Reddy, Steffen Schulze

Proceedings Volume 10810, 108100M (2018) https://doi.org/10.1117/12.2503550

KEYWORDS: Optical proximity correction, Metals, Error analysis, Vestigial sideband modulation, Visualization, Data corrections, Beam shaping, Process modeling, Image quality, Computer simulations

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Proceedings Article | 3 October 2018 Presentation + Paper

Extending mask data preparation to scale to thousands of CPUs and beyond

Archana Rajagopalan, Amanda Bowhill, Peter Buck, Bhardwaj Durvasula, Pascal Gilgenkrantz, Stephen Kim, Minyoung Park, Nageswara Rao, Steffen Schulze

Proceedings Volume 10810, 108100L (2018) https://doi.org/10.1117/12.2503551

KEYWORDS: Distributed computing, Data processing, Data storage servers, Data communications, Computing systems, Optical proximity correction

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Proceedings Article | 17 October 2014 Paper

14-nm photomask simulation sensitivity

John Sturtevant, Peter Buck, Steffen Schulze, David Fryer, Edita Tejnil, Kostas Adam, Michael Lam, Chris Clifford, Mike Oliver, Ana Armeanu, Franklin Kalk, Kent Nakagawa, Guoxiang Ning, Paul Ackmann, Fritz Gans, Christian Buergel

Proceedings Volume 9231, 92310I (2014) https://doi.org/10.1117/12.2066483

KEYWORDS: Photomasks, 3D modeling, Semiconducting wafers, Optical proximity correction, Data modeling, Calibration, Manufacturing, Photoresist materials, Metrology, Refractive index

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SPIE Journal Paper | 2 December 2013

Impact of 14-nm photomask uncertainties on computational lithography solutions

John Sturtevant, Edita Tejnil, Timothy Lin, Steffen Schulze, Peter Buck, Franklin Kalk, Kent Nakagawa, GuoXiang Ning, Paul Ackmann, Fritz Gans, Christian Buergel

JM3, Vol. 13, Issue 01, 011004, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011004

KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

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Proceedings Article | 10 September 2013 Paper

The impact of 14nm photomask variability and uncertainty on computational lithography solutions

John Sturtevant, Edita Tejnil, Peter Buck, Steffen Schulze, Franklin Kalk, Kent Nakagawa, Guoxiang Ning, Paul Ackmann, Fritz Gans, Christian Buergel

Proceedings Volume 8880, 88800F (2013) https://doi.org/10.1117/12.2030733

KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Calibration, Photoresist materials, Critical dimension metrology, Manufacturing, Data modeling, Mathematical modeling

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Proceedings Article | 12 April 2013 Paper

The impact of 14-nm photomask uncertainties on computational lithography solutions

John Sturtevant, Edita Tejnil, Tim Lin, Steffen Schultze, Peter Buck, Franklin Kalk, Kent Nakagawa, Guoxiang Ning, Paul Ackmann, Fritz Gans, Christian Buergel

Proceedings Volume 8683, 868307 (2013) https://doi.org/10.1117/12.2013748

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, 3D modeling, Calibration, Critical dimension metrology, Manufacturing, Process modeling, Data modeling, Computational lithography

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Proceedings Article | 8 November 2012 Paper

EUV mask blank defect avoidance solutions assessment

Ahmad Elayat, Peter Thwaite, Steffen Schulze

Proceedings Volume 8522, 85221W (2012) https://doi.org/10.1117/12.979154

KEYWORDS: Photomasks, Extreme ultraviolet, Manufacturing, Reticles, Semiconducting wafers, Inspection, Databases, Optical proximity correction, Extreme ultraviolet lithography, Software development

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Proceedings Article | 17 April 2012 Paper

Mask write time reduction: deployment of advanced approaches and their impact on established work models

S. Schulze, A. Elayat, T. Lin, E. Sahouria

Proceedings Volume 8352, 83520J (2012) https://doi.org/10.1117/12.923675

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Inspection, Semiconducting wafers, Manufacturing, Model-based design, Data processing, Resolution enhancement technologies, Forward error correction

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Proceedings Article | 14 October 2011 Paper

Assessment and comparison of different approaches for mask write time reduction

A. Elayat, T. Lin, E. Sahouria, S. Schulze

Proceedings Volume 8166, 816634 (2011) https://doi.org/10.1117/12.902443

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Inspection, Manufacturing, Semiconducting wafers, Optical alignment, Lithography, Model-based design, Forward error correction

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Proceedings Article | 14 October 2011 Paper

Reducing shot count through optimization-based fracture

Timothy Lin, Emile Sahouria, Nataraj Akkiraju, Steffen Schulze

Proceedings Volume 8166, 81660T (2011) https://doi.org/10.1117/12.897779

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photovoltaics, Resolution enhancement technologies, Optical proximity correction, Optimization (mathematics), Manufacturing, SRAF, Wafer-level optics

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Proceedings Article | 15 May 2010 Paper

Deployment of OASIS in the semiconductor industry: status, dependencies, and outlook

Joseph Davis, Steffen Schulze, Sai Fu, Yijun Tong

Proceedings Volume 7545, 75450B (2010) https://doi.org/10.1117/12.864158

KEYWORDS: Photomasks, Manufacturing, Data processing, Optical proximity correction, Inspection, Data storage, Semiconductors, Standards development, Electronic design automation, Manufacturing equipment

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Proceedings Article | 23 September 2009 Paper

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks

Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, Steffen Schulze

Proceedings Volume 7488, 748823 (2009) https://doi.org/10.1117/12.833443

KEYWORDS: Inspection, Photomasks, Metrology, Vestigial sideband modulation, Data conversion, Data processing, Manufacturing, Standards development, Semiconducting wafers, Computer simulations

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Proceedings Article | 11 May 2009 Paper

Optimizing computing resources for optimal throughput in a mask data preparation flow

Weidong Zhang, Ron Bennett, Pradiptya Ghosh, Steffen Schulze, Amanda Bowhill

Proceedings Volume 7379, 73792Y (2009) https://doi.org/10.1117/12.824349

KEYWORDS: Data storage, Clocks, Data processing, Photomasks, Testing and analysis, Data modeling, Iterative methods, Visualization, Distributed computing, Information technology

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Proceedings Article | 16 March 2009 Paper

Model based mask process correction and verification for advanced process nodes

Timothy Lin, Tom Donnelly, Steffen Schulze

Proceedings Volume 7274, 72742A (2009) https://doi.org/10.1117/12.814362

KEYWORDS: Photomasks, Etching, Optical proximity correction, Process modeling, Data modeling, Semiconducting wafers, Lithography, SRAF, Calibration, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

Compute resource management and turn around time control in mask data prep

Travis Lewis, Scott Goad, Kenneth Jantzen, Ahmed Nouh, Minyoung Park, Emile Sahouria, Steffen Schulze

Proceedings Volume 7122, 71222O (2008) https://doi.org/10.1117/12.801544

KEYWORDS: Databases, Optical proximity correction, Data centers, Metals, Photomasks, Control systems, Data processing, Resolution enhancement technologies, Optical components, Optical resolution

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Proceedings Article | 7 March 2008 Paper

Advanced mask process modeling for 45-nm and 32-nm nodes

Edita Tejnil, Yuanfang Hu, Emile Sahouria, Steffen Schulze, Ming Jing Tian, Eric Guo

Proceedings Volume 6924, 69243H (2008) https://doi.org/10.1117/12.772975

KEYWORDS: Data modeling, Photomasks, Calibration, Etching, Process modeling, Critical dimension metrology, Photoresist processing, Electron beam lithography, Cadmium, Lithography

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Proceedings Article | 16 November 2007 Paper

Reduction of layout complexity for shorter mask write-time

Sean Hannon, Travis Lewis, Scott Goad, Kenneth Jantzen, Jianlin Wang, Hien Vu, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers

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Proceedings Article | 1 November 2007 Paper

A user-programmable link between data preparation and mask manufacturing equipment

Weidong Zhang, Grant Davis, Emile Sahouria, Steffen Schulze, Mohammed Saad, Arne Seyfarth, Eric Poortinga

Proceedings Volume 6730, 67304H (2007) https://doi.org/10.1117/12.746988

KEYWORDS: Metrology, Photomasks, Computer programming, Manufacturing, Interfaces, Manufacturing equipment, Databases, Visualization, Optical proximity correction, Data modeling

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Proceedings Article | 30 October 2007 Paper

Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

Anders Österberg, Lars Ivansen, Angela Beyerl, Tom Newman, Amanda Bowhill, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 673034 (2007) https://doi.org/10.1117/12.747074

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Deep ultraviolet, Spatial light modulators, Lithography, Systems modeling, Model-based design, Acquisition tracking and pointing

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Proceedings Article | 11 May 2007 Paper

Embedded optical proximity correction for the Sigma7500 DUV mask writer

Anders Österberg, Lars Ivansen, Henrik Åhlfeldt, Hans Fosshaug, Tom Newman, Amanda Bowhill, Emile Sahouria, Steffen Schulze

Proceedings Volume 6607, 660704 (2007) https://doi.org/10.1117/12.728918

KEYWORDS: Photomasks, Optical proximity correction, Calibration, Semiconducting wafers, Deep ultraviolet, Systems modeling, Spatial light modulators, Matrices, Model-based design, Lithography

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Proceedings Article | 20 October 2006 Paper

Distributed computing in mask data preparation for 45-nm node and below

Weidong Zhang, Emile Sahouria, Steffen Schulze

Proceedings Volume 6349, 63493T (2006) https://doi.org/10.1117/12.685144

KEYWORDS: Distributed computing, Process control, Photomasks, Computing systems, Data processing, Parallel processing, Databases, Manufacturing, Optical proximity correction, Signal processing

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Proceedings Article | 28 June 2005 Paper

Pattern based mask process correction: impact on data quality and mask writing time

Emile Sahouria, Amanda Bowhill, Steffen Schulze

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617133

KEYWORDS: Photomasks, Data corrections, Manufacturing, Convolution, Semiconducting wafers, Mask making, Optical proximity correction, Critical dimension metrology, Tolerancing, Etching

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Proceedings Article | 16 June 2005 Paper

Extending OASIS for the unification of mask data representation

Emile Sahouria, Steffen Schulze, Toshio Suzuki, Junji Hirumi

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637283

KEYWORDS: Photomasks, Manufacturing, Data conversion, Resolution enhancement technologies, Vestigial sideband modulation, Standards development, Mask making, Inspection equipment, Inspection, Integrated circuits

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Proceedings Article | 12 May 2005 Paper

Illumination optimization effects on OPC and MDP

Travis Brist, Steffen Schulze

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600378

KEYWORDS: Optical proximity correction, Critical dimension metrology, Data modeling, Process modeling, Optimization (mathematics), Mask making, Tolerancing, Manufacturing, Structural design

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Proceedings Article | 5 May 2005 Paper

The prospects for hierarchical data processing with growing complexity of the post-tapeout flow

Steffen Schulze, Emile Sahouria

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600659

KEYWORDS: Photomasks, Manufacturing, Data corrections, Data processing, Mask making, Lithography, Semiconducting wafers, Wafer manufacturing, Etching, Convolution

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Proceedings Article | 6 December 2004 Paper

Distributed processing in integrated data preparation flow

Steffen Schulze, George Bailey

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569324

KEYWORDS: Optical proximity correction, Databases, Parallel processing, Distributed computing, Data processing, Photomasks, Data storage, Data integration, Computing systems, Manufacturing

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Proceedings Article | 6 December 2004 Paper

MEEF-based mask inspection

Wilhelm Maurer, James Word, Steffen Schulze, Shumay Shang

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569330

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Semiconducting wafers, SRAF, Printing, Lithography, Resolution enhancement technologies, Data modeling, Manufacturing

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Proceedings Article | 20 August 2004 Paper

OASIS-based unification of mask data representation

Emile Sahouria, Steffen Schulze

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557740

KEYWORDS: Photomasks, Data conversion, Manufacturing, Resolution enhancement technologies, Vestigial sideband modulation, Integrated circuits, Mask making, Beam shaping, Transform theory, Inspection

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Proceedings Article | 20 August 2004 Paper

An agile mask data preparation and writer dispatching approach

Chih-tung Hsu, Y. Chen, S. Hsin, Laurent Tuo, Steffen Schulze

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557739

KEYWORDS: Photomasks, Manufacturing, Databases, Inspection equipment, Computer aided design, Inspection, Optical proximity correction, Electronic design automation, Semiconductor manufacturing, Visualization

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Proceedings Article | 2 June 2004 Paper

OASIS: progress on implementing the new stream format for containing data size explosion

Steffen Schulze, Kent Nakagawa, Peter Buck

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568027

KEYWORDS: Optical proximity correction, Information operations, Manufacturing, Integrated circuits, Data conversion, Data processing, Seaborgium, Photomasks, Databases, Beam shaping

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Proceedings Article | 3 May 2004 Paper

Interaction of RET and MDP: optimization for reducing the mask writing time

James Word, Steffen Schulze

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.535653

KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Metals, Manufacturing, Tolerancing, Lithography, Silicon, Vestigial sideband modulation, Statistical analysis

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Proceedings Article | 3 May 2004 Paper

OASIS-based data preparation flows: progress report on containing data size explosion

Steffen Schulze, Pat LaCour, Laurence Grodd

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.535683

KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Data processing, Integrated circuits, Standards development, Data conversion, Data compression, Acquisition tracking and pointing, Visualization

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Proceedings Article | 17 December 2003 Paper

Parallel processing approaches in RET and MDP: new hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow

Steffen Schulze, Emile Sahouria, Robert Todd, Laurence Grodd, Mary Finch

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518230

KEYWORDS: Resolution enhancement technologies, Parallel processing, Photomasks, Computer networks, Data processing, Manufacturing, Distributed computing, Visualization, Databases, Data storage

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Proceedings Article | 17 December 2003 Paper

Optimization of data handling prior to fracturing for reduction of mask writing time

James Word, Steffen Schulze

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518232

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Manufacturing, Tolerancing, Vestigial sideband modulation, Control systems, Geometrical optics, Visualization, Roads, Design for manufacturability

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Proceedings Article | 28 August 2003 Paper

High-performance fracturing for variable shaped beam mask writing machines

Steffen Schulze, Emile Sahouria, Eugene Miloslavsky

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504274

KEYWORDS: Photomasks, Manufacturing, Resolution enhancement technologies, Optical proximity correction, Beam shaping, Vestigial sideband modulation, Data conversion, Optics manufacturing, Detection and tracking algorithms, Lithography

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Proceedings Article | 10 July 2003 Paper

New stream format: progress report on containing data size explosion

Patrick LaCour, Alfred Reich, Kent Nakagawa, Steffen Schulze, Laurence Grodd

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485260

KEYWORDS: Photomasks, Manufacturing, Inspection, Integrated circuits, Data storage, Binary data, Design for manufacturability, Visualization, Mask making, Integrated circuit design

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Proceedings Article | 10 July 2003 Paper

Optimization of the data preparation for variable-shaped beam mask writing machines

Steffen Schulze, Patrick LaCour

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485261

KEYWORDS: Photomasks, Manufacturing, Vestigial sideband modulation, Beam shaping, Resolution enhancement technologies, Optical proximity correction, Mask making, Data conversion, Optics manufacturing, Lithography

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Proceedings Article | 10 July 2003 Paper

Statistical data assessment for optimization of the data preparation and manufacturing

Steffen Schulze, Patrick LaCour

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485262

KEYWORDS: Manufacturing, Photomasks, Metrology, Metals, Optimization (mathematics), Statistical analysis, Semiconducting wafers, Critical dimension metrology, Wafer manufacturing, Calibration

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Proceedings Article | 28 May 2003 Paper

Integration of OPC and mask data preparation

Steffen Schulze, Pat LaCour, Norma Rodriguez

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514947

KEYWORDS: Photomasks, Optical proximity correction, Resolution enhancement technologies, Databases, Manufacturing, Optical design, Interfaces, Data storage, Etching, Process modeling

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Proceedings Article | 27 December 2002 Paper

GDS-based mask data preparation flow: data volume containment by hierarchical data processing

Steffen Schulze, Pat LaCour, Peter Buck

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468273

KEYWORDS: Photomasks, Manufacturing, Data processing, Resolution enhancement technologies, Lithography, Process control, Data conversion, Data storage, Optical proximity correction, Data communications

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As the industry enters the development of the 65nm node the pressure on the data path and tapeout flow is growing. Design complexity and increased deployment of resolution enhancement techniques (RET) result in rapidly growing file sizes, which turns what used to be the relatively simple task of mask data preparation into a real bottleneck. This discussion introduces the data preparation scheme in the mask house and analyzes its evolution. Mask data preparation (MDP) has evolved from a flow that only needed to support a single mask lithography tool data format (MEBES) with minimal data alteration steps to one which requires the support of many mask lithography tool data formats and at the same time requires significant data alteration to support the increased precision necessary for today’s advanced masks.. However, the MDP flow developed around the MEBES format and it’s derivatives still exists. The design community has migrated towards the use of hierarchical data formats and processes to control file size and processing time. MDP, which from a file size and process complexity point of view is beginning to look more and more like the advanced RET operations performed on the data prior to mask manufacturing, is still standardized on a flat data format that is poorly optimized for a growing number of mask lithography tools. Based on examples it will be shown how this complicates the data handling further. An alternate data preparation flow accommodating the larger files and re-gaining flexibility for turnaround time (TAT) and throughput management is suggested. This flow utilizes the hierarchical GDS-II format as the exchange format for mask data preparation. It complements the existing flow for the most complex designs. The introduction of a hierarchical exchange format enables the transfer of a number of necessary data preparation steps into the hierarchical domain. Data processing strategies are discussed. The paper illustrates the benefit of hierarchical processing based on GDS-II files with experimental data on file size reduction and TAT improvement for direct format conversions vs. re-fracturing as well as other processing steps. The implications for the established data preparation approaches and potential alternatives for the communication between the mask manufacturer and the customer will be discussed. The potential for further enhancements by converting to a hierarchical format that has a more efficient data representation than the commonly used GDS-II format will be discussed and illustrated.

Proceedings Article | 30 July 2002 Paper

Model-based OPC considering process window aspects: a study

Steffen Schulze, O'Seo Park, Rainer Zimmermann, Ming-Jui Chen, Pat LaCour, Emile Sahouria, Yuri Granik, Nicolas Cobb

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474489

KEYWORDS: Optical proximity correction, Image processing, Process modeling, Lithography, Model-based design, Visualization, Resolution enhancement technologies, Phase shifting, Photomasks, Detection and tracking algorithms

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Proceedings Article | 30 July 2002 Paper

Lithographic comparison of assist feature design strategies

Katrin Reblinksy, Tobias Bach, Steffen Schulze, Martin Commons

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474640

KEYWORDS: SRAF, Critical dimension metrology, Lithography, Photomasks, Semiconducting wafers, Computer simulations, Optical proximity correction, Optical lithography, Computer aided design, Lithographic illumination

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Proceedings Article | 18 August 2000 Paper

Advanced lithography kits: serifs and hammerhead

Hang-Yip Liu, Steffen Schulze, Alan Thomas, Anne McGuire, Michael Cross

Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395715

KEYWORDS: Lithography, Photomasks, Resolution enhancement technologies, Optical lithography, Printing, Mask making, Inspection, Scanning electron microscopy

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