Mr. Stephen H. Kim Profile

Stephen H. Kim

Director at Siemens EDA

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Author

Publications (14)

Proceedings Article | 20 November 2024 Poster + Paper

Automatic classification of EUV mask defects inspected using DUV inspection optics

Aravindh Rajiv, Samir Bhamidipati, Mark Pereira, Sankaranarayanan Paninjath, Neha Razdan, Stephen Kim, Jinhyuk Choi, Jonghoon Lim, Sujeong Won, Dongwook Lee, Woojin Kim, Jongha Park

Proceedings Volume 13216, 132162I (2024) https://doi.org/10.1117/12.3034707

KEYWORDS: Inspection, Extreme ultraviolet, Deep ultraviolet, Polarization, Image classification, Image processing

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Proceedings Article | 12 November 2024 Presentation + Paper

Multigon-based curvilinear mask rule checks for advanced mask data preparation applications

Amogh Raj, Rachit Sharma, Ranganadh Peesapati, Sayalee Gharat, Stephen Kim, Ingo Bork

Proceedings Volume 13216, 132161O (2024) https://doi.org/10.1117/12.3034684

KEYWORDS: Optical proximity correction, Manufacturing, Design rules, Industry, Lithography, Semiconductors, Compliance

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Proceedings Article | 21 November 2023 Presentation + Paper

Multibeam fracture flow based on multigon format input

Apurva Bajpai, Rachit Sharma, Bhardwaj Durvasula, Ranganadh Peespati, Sayalee Gharat, Stephen Kim

Proceedings Volume 12751, 127510A (2023) https://doi.org/10.1117/12.2687753

KEYWORDS: Process modeling, Photomasks, Optical lithography, Lithography, Data conversion, Extreme ultraviolet, Data processing, Contour modeling, Advanced patterning

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Proceedings Article | 21 November 2023 Presentation + Paper

Opportunities, challenges, and applications of native curvilinear data representation in post-tape-out flows

Bhardwaj Durvasula, Sayalee Gharat, Ranganadh Peesapati, Archana Rajagopalan, Rachit Sharma, Stephen Kim, Ingo Bork

Proceedings Volume 12751, 1275107 (2023) https://doi.org/10.1117/12.2687645

KEYWORDS: Optical proximity correction, Lithography, Algorithm development, Photomasks, Industry

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Proceedings Article | 28 April 2023 Poster + Paper

CPU time prediction using machine learning for post-tapeout flow runs

Maram Salah, Ahmed Hamed Fathi Hamed, Stephen Kim, Pascal Gilgenkrantz, Wooil Han, Roberto Ramsis, Ken Jantzen

Proceedings Volume 12495, 124951O (2023) https://doi.org/10.1117/12.2657666

KEYWORDS: Data analysis, Data modeling, Machine learning, Feature extraction

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Proceedings Article | 16 September 2022 Paper

Checkpointing in EDA application for tapeout operation

Kuang Han Chen, Soohong Kim, Hien Vu, Stephen Kim, Ming Feng Shen

Proceedings Volume 12325, 1232507 (2022) https://doi.org/10.1117/12.2641214

KEYWORDS: Optical proximity correction, Photomasks, Electronic design automation, Resolution enhancement technologies, SRAF, Data storage, Semiconducting wafers, Scattering

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Proceedings Article | 12 October 2021 Presentation + Paper

Benefits of an integrated pipelined flow for curvilinear MPC and multibeam fracture

Apurva Bajpai, Rachit Sharma, Amanda Bowhill, Stephen Kim, Soohong Kim

Proceedings Volume 11855, 118550V (2021) https://doi.org/10.1117/12.2601100

KEYWORDS: Data processing, Photomasks, Semiconductor manufacturing, Parallel processing

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Proceedings Article | 3 October 2018 Presentation + Paper

Extending mask data preparation to scale to thousands of CPUs and beyond

Archana Rajagopalan, Amanda Bowhill, Peter Buck, Bhardwaj Durvasula, Pascal Gilgenkrantz, Stephen Kim, Minyoung Park, Nageswara Rao, Steffen Schulze

Proceedings Volume 10810, 108100L (2018) https://doi.org/10.1117/12.2503551

KEYWORDS: Distributed computing, Data processing, Data storage servers, Data communications, Computing systems, Optical proximity correction

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Proceedings Article | 19 September 2018 Paper

Maximizing utilization of large-scale mask data preparation clusters

Pascal Gilgenkrantz, Stephen Kim, Wooil Han, Minyoung Park, Min Tsao

Proceedings Volume 10775, 1077513 (2018) https://doi.org/10.1117/12.2326553

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Visualization, Manufacturing, Network architectures, Electronic design automation, Operating systems

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Proceedings Article | 18 March 2015 Paper

Comparison of OPC job prioritization schemes to generate data for mask manufacturing

Travis Lewis, Vijay Veeraraghavan, Kenneth Jantzen, Stephen Kim, Minyoung Park, Gordon Russell, Mark Simmons

Proceedings Volume 9427, 942711 (2015) https://doi.org/10.1117/12.2086927

KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Data processing, Front end of line, Back end of line, Visualization, Design for manufacturability, Integrated circuits, Semiconductors

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Proceedings Article | 14 October 2011 Paper

High speed mask inspection data prep flow based on pipelining

Dan Hung, Domingo Morales, Juan Pablo Canepa, Stephen Kim, Po Liu, Jean-Paul Sier, Patrick LoPresti

Proceedings Volume 8166, 81660R (2011) https://doi.org/10.1117/12.896964

KEYWORDS: Inspection, Data conversion, Data processing, Databases, Manufacturing, Explosives, Neodymium, Polonium, Photomask technology, Current controlled current source

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Proceedings Article | 20 May 2011 Paper

In-die job automation for PROVE

Ronald Lesnick, Stephen Kim, Matthias Waechter, Dirk Seidel, Andreas Mueller, Dirk Beyer

Proceedings Volume 8081, 80810L (2011) https://doi.org/10.1117/12.899779

KEYWORDS: Metrology, Photomasks, Interfaces, Image registration, Image analysis, Human-machine interfaces, Visualization, Double patterning technology, 193nm lithography, Lithography

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Proceedings Article | 25 September 2010 Paper

In-Die registration metrology: design data preparation solution

Frank Laske, Loc Ho, Michael Ferber, Klaus-Dieter Roeth, Dieter Adam, Stephen Kim, Seurien Chou

Proceedings Volume 7823, 78232M (2010) https://doi.org/10.1117/12.864281

KEYWORDS: Metrology, Image registration, Photomasks, Measurement devices, Double patterning technology, Semiconducting wafers, Reticles, Image processing, Detection and tracking algorithms, Overlay metrology

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Proceedings Article | 24 March 2009 Paper

Implementation of multiple ROI with single FOV for advanced mask metrology

Kyu-hwa Jeong, Hatsey Frezghi, Malahat Tavassoli, Stephen Kim, Ray Morgan

Proceedings Volume 7272, 72724D (2009) https://doi.org/10.1117/12.826930

KEYWORDS: Scanning electron microscopy, Metrology, Time metrology, Photomasks, Resolution enhancement technologies, Optical proximity correction, Computed tomography, Critical dimension metrology, Cadmium, Control systems

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Showing 5 of 14 publications

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