Dr. Stephen P. Renwick
Director, Imaging Physics at Nikon Research Corp of America
SPIE Involvement:
Conference Chair | Author | Editor
Publications (19)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11613, Optical Microlithography XXXIV
KEYWORDS: Deep ultraviolet, Solid state lasers, Laser scanners, Printing, Spatial light modulators, 3D scanning, Semiconducting wafers, Laser optics, Prototyping, Security printing

SPIE Journal Paper | 30 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Scanners, Optical proximity correction, Photomasks, Lithography, Metals, Error analysis, Overlay metrology, Semiconducting wafers, Statistical analysis, Optical lithography

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical design, Optical lithography, Statistical analysis, Etching, Image processing, Scanners, Ions, Monte Carlo methods, Computational lithography, Optical proximity correction, Optical alignment, Semiconducting wafers, Integrated circuit design, Performance modeling, 193nm lithography

Proceedings Article | 26 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Scanners, Ions, Manufacturing, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Scanners, Image acquisition, Photomasks, Computational lithography, Optical proximity correction, Optimization (mathematics), Near field optics, Fiber optic illuminators, Maxwell's equations

Showing 5 of 19 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 16 October 2020

Conference Committee Involvement (2)
Photomask Technology
26 September 2021 | Monterey, California, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
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