Dr. Steve Wittekoek Profile

Dr. Steve Wittekoek

Consultant

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 17 May 1994 Paper

Practical 0.35-um i-line lithography

Paul Luehrmann, Stefan Wittekoek, Steven Hansen

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175435

KEYWORDS: Photoresist materials, Nanoimprint lithography, Reticles, Photoresist processing, Semiconducting wafers, Image processing, Lithography, Photoresist developing, Optical lithography, Image quality

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Proceedings Article | 8 August 1993 Paper

Wide-field deep-UV wafer stepper for 0.35-micron production

Stefan Wittekoek, Martin van den Brink, G. Poppelaars, Marijan Reuhman-Huisken, A. Grassman, U. Boettinger

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150454

KEYWORDS: Deep ultraviolet, Semiconducting wafers, Optical alignment, Optical lithography, Lithography, Image quality, Data transmission, Excimer lasers, Control systems, Wafer-level optics

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Proceedings Article | 1 June 1992 Paper

Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules

Barton Katz, James Greeneich, Richard Rogoff, Steve Slonaker, Stefan Wittekoek, Paul Luehrmann, Martin van den Brink, Douglas Ritchie

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130363

KEYWORDS: Lithography, Optical alignment, Phase shifts, Overlay metrology, Reticles, Metals, Silicon, Deep ultraviolet, Semiconducting wafers, Optical lithography

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Proceedings Article | 1 June 1992 Paper

In-process image detection technique for determination of overlay and image quality for ASM-L wafer stepper

Rainer Pforr, Stefan Wittekoek, Roland Van Den Bosch, Luc Van den Hove, Rik Jonckheere, Theo Fahner, Rolf Seltmann

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130355

KEYWORDS: Optical alignment, Semiconducting wafers, Diffraction gratings, Image quality, Information operations, Diffraction, Refractive index, Oxides, Overlay metrology, Silicon

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Proceedings Article | 1 July 1991 Paper

New 0.54 aperture i-line wafer stepper with field-by-field leveling combined with global alignment

Martin van den Brink, Barton Katz, Stefan Wittekoek

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44826

KEYWORDS: Semiconducting wafers, Sensors, Optical alignment, Optical lithography, Interferometers, Wafer-level optics, Particles, Lenses, Overlay metrology, Metrology

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Proceedings Article | 1 June 1990 Paper

Deep-UV wafer stepper with through-the-lens wafer to reticle alignment

Stefan Wittekoek, Martin van den Brink, Henk Linders, Judon Stoeldraijer, J. Martens, Douglas Ritchie

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20207

KEYWORDS: Optical alignment, Deep ultraviolet, Semiconducting wafers, Reticles, Image sensors, Calibration, Excimer lasers, Distortion, Control systems, Optical lithography

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Proceedings Article | 1 June 1990 Paper

Automatic on-line wafer stepper calibration system

Martin van den Brink, Hans Franken, Stefan Wittekoek, Theo Fahner

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20056

KEYWORDS: Image sensors, Sensors, Semiconducting wafers, Metrology, Calibration, Reticles, Monochromatic aberrations, Deep ultraviolet, Distortion, Optical alignment

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