Dr. Steven M. Labovitz Profile

Dr. Steven M. Labovitz

at Pixer Technology Inc

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Publications (6)

Proceedings Article | 17 October 2008 Paper

Detection of progressive transmission loss due to haze with Galileo mask DUV transmittance mapping based on non imaging optics

Steven Labovitz, Guy Ben-Zvi, Vladimir Dmitriev, Erez Graitzer, Eitan Zait

Proceedings Volume 7122, 712216 (2008) https://doi.org/10.1117/12.801558

KEYWORDS: Photomasks, Semiconducting wafers, Deep ultraviolet, Air contamination, Pellicles, Critical dimension metrology, Quartz, Nonimaging optics, Metrology, Reticles

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In this paper, we expand on our earlier work^1,2 reporting the use of high sensitivity DUV transmission metrology as a means for detection of progressive transmission loss on mask and pellicle surfaces. We also report a use case for incoming reticle qualification based on DUV transmission uniformity. Traditional inspection systems rely on algorithms to locate discrete defects greater than a threshold size (typically > 100nm), or printing a wafer and then looking for repeating defects using wafer inspection and SEM review. These types of defect inspection do not have the ability to detect transmission degradation at the low levels where it begins to impact yield. There are numerous mechanisms for transmission degradation, including haze in its early, thin film form, electric-field induced field migration, and pellicle degradation. During the early development of haze, it behaves as a surface film which reduces 193nm transmission and requires compensation by scanner dose. The film forms in a non-uniform fashion, resulting from non-uniformity of exposure on the pattern side due to varying dose passing through the attenuating layers. As this non-uniformity evolves, there is a gradual loss of wafer critical dimension uniformity (CDU) due to a degradation of the exposure dose homogeneity. Electric-field induced migration also appears to manifest as a non-uniform transmission loss, typically presenting with a radial signature. In this paper we present evidence that a DUV transmission measurement system, Galile^TM, is capable of detecting low levels of transmission loss, prior to CDU related yield loss or the appearance of printing defects. Galileo is an advanced DUV transmission metrology system which utilizes a wide-band, incoherent light source and non-imaging optics to achieve sensitivities to transmission changes of less than 0.1%. Due to its very high SNR, it has a fast MAM time of less than 1 sec per point, measuring a full field mask in as little as 30 minutes. A flexible user interface enables users to easily define measurement recipes, threshold sensitivities, and time-based tracking of transmission degradation. The system measures through pellicle under better than class 1 clean air conditions.

Proceedings Article | 19 May 2008 Paper

Mask CD control (CDC) using AIMS as the CD metrology data source

Guy Ben-Zvi, Eitan Zait, Vladimir Dmitriev, Steven Labovitz, Erez Graitzer, Klaus Böhm, Robert Birkner, Thomas Scheruebl

Proceedings Volume 7028, 70281C (2008) https://doi.org/10.1117/12.793054

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Signal attenuation, Scanners, Airborne remote sensing, Calibration, Data corrections, Cadmium, Scatterometry

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Proceedings Article | 19 May 2008 Paper

Very high sensitivity mask transmittance mapping and measurements based on non imaging optics with Galileo

Guy Ben-Zvi, Vladimir Dmitriev, Erez Graitzer, Eitan Zait, Ofir Sharoni, Steven Labovitz

Proceedings Volume 7028, 702828 (2008) https://doi.org/10.1117/12.798462

KEYWORDS: Air contamination, Photomasks, Pellicles, Semiconducting wafers, Coating, Critical dimension metrology, Chromium, Deep ultraviolet, Silica, Printing

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Proceedings Article | 9 November 2005 Paper

Optimized inspection of advanced reticles on the TeraScan reticle inspection tool

Aditya Dayal, J.-P. Sier, Weston Sousa, Steven Labovitz

Proceedings Volume 5992, 599245 (2005) https://doi.org/10.1117/12.634078

KEYWORDS: Inspection, Reticles, Contamination, Photomasks, Image transmission, Defect detection, Databases, Digital breast tomosynthesis, Resolution enhancement technologies, Opacity

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Proceedings Article | 22 January 2001 Paper

Technological challenges in implementation of alternating phase-shift mask

Wilman Tsai, Qi-De Qian, Ken Buckmann, Wen-Hao Cheng, Long He, Brian Irvine, Marilyn Kamna, Yulia Korobko, Michael Kovalchick, Steven Labovitz, R. Talevi, Jeff Farnsworth

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410720

KEYWORDS: Etching, Photomasks, Inspection, Image processing, Critical dimension metrology, Optical lithography, Semiconducting wafers, Plasma etching, Phase shifts, Isotropic etching

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Proceedings Article | 1 September 1998 Paper

Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-um-generation advanced mask fabrication

Wilman Tsai, Frederick Chen, Marilyn Kamna, Scott Chegwidden, Steven Labovitz, Jeff Farnsworth, Giang Dao

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328796

KEYWORDS: Plasma etching, Etching, Plasma, Wet etching, Critical dimension metrology, Chromium, Optical proximity correction, Photomasks, Mask making, Magnesium

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Showing 5 of 6 publications

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