Dr. Stewart A. Robertson
Technical Marketing Manager at KLA Texas
SPIE Involvement:
Author
Publications (74)

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Optical lithography, Printing, Image quality, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Binary data, Phase shifts

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Computer simulations, Extreme ultraviolet lithography, Optical proximity correction, Failure analysis, Stochastic processes, Model-based design

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Stochastic processes

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Computer simulations, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, 3D acquisition, Calibration, Manufacturing, Inspection, Computer simulations, Scanning electron microscopy, Monte Carlo methods, 3D metrology, Critical dimension metrology, Photoresist processing, Stochastic processes

Showing 5 of 74 publications
Conference Committee Involvement (2)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Lithography for Semiconductor Manufacturing
19 May 1999 | Edinburgh, United Kingdom
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