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Sukjong Bae
Principal Engineer at SAMSUNG Electronics Co Ltd
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Publications (3)
Proceedings Article | 30 June 2012 Paper
Deflector contamination in E-beam mask writer and its effect on pattern placement error of photomask for sub 20nm device node
Sukjong Bae, Jin Choi, Sung Hoon Park, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume 8441, 84410C (2012) https://doi.org/10.1117/12.981613
KEYWORDS: Contamination, Photomasks, Electron beams, Optical systems, Image quality, Error analysis, Extreme ultraviolet, Mask making, Optimization (mathematics), Double patterning technology
Proceedings Article | 14 October 2011 Paper
Pattern placement error due to resist charging effect at 50kV e-beam writer: mechanism and its correction
Proceedings Volume 8166, 81661Z (2011) https://doi.org/10.1117/12.898856
KEYWORDS: Photomasks, Extreme ultraviolet, Scattering, Critical dimension metrology, Monte Carlo methods, Lithography, Electron beam lithography, Semiconducting wafers, Double patterning technology, Astatine
Proceedings Article | 30 October 2007 Paper
Improvement of mask CD uniformity for below 45-nm node technology
Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810
KEYWORDS: Etching, Critical dimension metrology, Chromium, Photomasks, Curium, Ions, Electron beams, Plasma etching, Photoresist processing, Information operations
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