Mr. Sumito Shimizu Profile

Sumito Shimizu

at Nikon Corp

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 20 May 2004 Paper

Total performance of Nikon EB stepper R&D tool

Tomoharu Fujiwara, Noriyuki Hirayanagi, Jin Udagawa, Junji Ikeda, Sumito Shimizu, Hidekazu Takekoshi, Kazuaki Suzuki

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537008

KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Distortion, Electron beam lithography, Optical alignment, Interferometers, Wafer-level optics, Scanning electron microscopy, Projection lithography

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Proceedings Article | 20 May 2004 Paper

Resist outgassing in electron projection lithography

Tasuku Matsumiya, Tomoyuki Ando, Masaaki Yoshida, Kiyoshi Ishikawa, Sumito Shimizu

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536168

KEYWORDS: Polymers, Electron beam lithography, Protactinium, Lithography, Electroluminescence, Projection lithography, Optical lithography, Semiconducting wafers, Neodymium, Electron beams

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Proceedings Article | 16 June 2003 Paper

Defect printability of hole pattern in electron projection lithography

Jiro Yamamoto, Yoichi Tomo, Sumito Shimizu, Teruo Iwasaki, Masaki Yamabe

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484976

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Diamond, Defect inspection, Electron beam lithography, Projection lithography, Inspection, Defect detection

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Proceedings Article | 16 June 2003 Paper

CD controllability of proximity effect correction in EPL

Sumito Shimizu, Kazuaki Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484724

KEYWORDS: Backscatter, Critical dimension metrology, Reticles, Semiconducting wafers, Photomasks, Image sensors, Artificial intelligence, Silicon, Photoresist processing, Data conversion

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Proceedings Article | 16 June 2003 Paper

Supercritical resist dry technique for electron-beam projection lithography (EPL)

George Petricich, Kohei Suzuki, Jun Munemasa, Tetsuya Yoshikawa, Nobuyuki Kawakami, Sumito Shimizu, Manabu Watanabe

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484990

KEYWORDS: Liquids, Etching, Single crystal X-ray diffraction, Photoresist processing, Plasma etching, Lithography, Capillaries, Carbon dioxide, Projection lithography, Semiconducting wafers

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Proceedings Article | 1 July 2002 Paper

Defect printability analysis on electron projection lithography with diamond stencil reticle

Yoichi Tomo, Yoshinori Kojima, Sumito Shimizu, Manabu Watanabe, Hiroshi Takenaka, Hiroshi Yamashita, Teruo Iwasaki, Kimitoshi Takahashi, Masaki Yamabe

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472351

KEYWORDS: Reticles, Photomasks, Diamond, Defect inspection, Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Projection lithography, Defect detection

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Proceedings Article | 11 March 2002 Paper

EPL reticle technology

Norihiro Katakura, Shin-ichi Takahashi, Masashi Okada, Sumito Shimizu, Shintaro Kawata

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458254

KEYWORDS: Reticles, Silicon, Semiconducting wafers, Inspection, Electron beams, Scattering, Etching, Laser scattering, Argon, Aerosols

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Proceedings Article | 20 August 2001 Paper

Nikon EB Stepper: the latest development status

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro, Hajime Yamamoto

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436632

KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Silicon, Sensors, Optical alignment, Optical lithography, Photomasks, Wafer-level optics, Image sensors

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Proceedings Article | 20 August 2001 Paper

Highly accurate CD control at stitching region for electron-beam projection lithography

Tomoharu Fujiwara, Takeshi Irita, Sumito Shimizu, Hajime Yamamoto, Kazuaki Suzuki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436696

KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Projection lithography, Electron beams, Electron beam lithography, Scattering, Optical simulations, Scanning electron microscopy, Laser scattering

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Proceedings Article | 21 July 2000 Paper

Repair method on silicon stencil reticles for EB projection lithography

Sumito Shimizu, Shintaro Kawata, Takashi Kaito

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390095

KEYWORDS: Reticles, Scattering, Silicon, Laser scattering, Opacity, Electron beams, Monte Carlo methods, Etching, Projection lithography, Critical dimension metrology

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Proceedings Article | 21 July 2000 Paper

Investigation of proximity effect correction in electron projection lithography (EPL)

Teruaki Okino, Kazuaki Suzuki, Kazuya Okamoto, Shintaro Kawata, Kiyoshi Uchikawa, Syouhei Suzuki, Sumito Shimizu, Tomoharu Fujiwara, Atsushi Yamada, Koichi Kamijo

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390059

KEYWORDS: Reticles, Semiconducting wafers, Lithography, Electron beam lithography, Projection lithography, Silicon, Scattering, Electron beams, Backscatter, Computer aided design

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Proceedings Article | 21 July 2000 Paper

Data of scattered electron characteristics in 100-kV EB stepper

Kenji Morita, Takehisa Yahiro, Sumito Shimizu, Hajime Yamamoto, Noriyuki Hirayanagi, Tomoharu Fujiwara, Syouhei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390111

KEYWORDS: Reticles, Scattering, Silicon, Semiconducting wafers, Laser scattering, Electron beams, Monte Carlo methods, Lithography, Calibration, Optical alignment

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Proceedings Article | 21 July 2000 Paper

Nikon EB stepper: its system concept and countermeasures for critical issues

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390057

KEYWORDS: Reticles, Semiconducting wafers, Silicon, Electron beams, Critical dimension metrology, Electron beam lithography, Scattering, Wafer-level optics, Sensors, Optical alignment

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Showing 5 of 13 publications

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