Sunwook Jung
Principal Engineer
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Etching, Optical proximity correction, Mahalanobis distance, Machine learning, Convolution, Statistical modeling, Metals, Calibration, Optical lithography, Lithography

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Error analysis, Optical lithography, Visualization, Extreme ultraviolet, Nanoimprint lithography, Tolerancing, Bridges, Process engineering, Visual process modeling, Computational lithography, Process modeling, Etching, Feature extraction, Instrument modeling, Calibration, Critical dimension metrology

Proceedings Article | 28 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Etching, Metals, Reactive ion etching, Cadmium, Optical proximity correction, Data modeling, Semiconducting wafers, 3D modeling, Back end of line, Image processing

Proceedings Article | 17 March 2015 Paper
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, 3D modeling, Photoresist materials, Critical dimension metrology, Optical proximity correction, Calibration, 3D image processing, Semiconductors, Lithography, Tolerancing

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Photomasks, Optical proximity correction, Oxides, Critical dimension metrology, Semiconducting wafers, Reflectivity, Calibration, Data modeling, Model-based design, Photoresist materials

Showing 5 of 9 publications
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