Mr. Sung-Gyu Lee Profile

Sung-Gyu Lee

at Hanyang Univ

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 7 November 2018 Presentation

Extreme ultraviolet pellicle cooling by hydrogen gas flow (Conference Presentation)

Hye-Lim Lee, Sung-Gyu Lee, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10809, 108091B (2018) https://doi.org/10.1117/12.2502731

KEYWORDS: Pellicles, Extreme ultraviolet, Hydrogen, Extreme ultraviolet lithography, Finite element methods

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Proceedings Article | 11 October 2018 Paper

A possible wafer heating during EUV exposure

Se-Hun Oh, Sung-Gyu Lee, Jae-Hun Park, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 10809, 108091R (2018) https://doi.org/10.1117/12.2502918

KEYWORDS: Extreme ultraviolet, Infrared radiation, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Lithography, Optical lithography, EUV optics, Reflectivity, Wafer-level optics

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Proceedings Article | 9 October 2018 Presentation + Paper

Pattern degradation with larger particles on EUV pellicle

Hee-Ra No, Sung-Gyu Lee, Se-Hun Oh, Hye-Keun Oh

Proceedings Volume 10809, 108091G (2018) https://doi.org/10.1117/12.2502784

KEYWORDS: Particles, Extreme ultraviolet, Pellicles, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Photomasks, Contamination, Applied physics, Lithography

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Proceedings Article | 22 March 2018 Paper

Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10583, 1058322 (2018) https://doi.org/10.1117/12.2299495

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Computer simulations, Multilayers, Image processing, Semiconducting wafers, Tantalum, Nickel

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Proceedings Article | 26 October 2017 Paper

Wrinkle formation analysis in extreme-ultraviolet pellicle

Hae-Nam Jeong, Guk-Jin Kim, Sung-Gyu Lee, Hye-Keun Oh

Proceedings Volume 10450, 104501Q (2017) https://doi.org/10.1117/12.2281036

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide, Finite element methods, Graphene

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Proceedings Article | 16 October 2017 Paper

Lifetime impact on residual stress of EUV pellicle

Min-Woo Kim, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, 104501O (2017) https://doi.org/10.1117/12.2280692

KEYWORDS: Pellicles, Silicon carbide, Silicon, Ruthenium, Extreme ultraviolet, Finite element methods, Extreme ultraviolet lithography, Manufacturing, Silica, Photomasks

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Proceedings Article | 16 October 2017 Paper

Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow

Myung-Gi Kang, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, 104501N (2017) https://doi.org/10.1117/12.2280691

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Convection, Cooling systems, Finite element methods, Silicon, Hydrogen, Photomasks, Radiation effects

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Proceedings Article | 16 October 2017 Paper

Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection

Sung-Gyu Lee, Guk-Jin Kim, Su-Mi Hur, Hye-Keun Oh

Proceedings Volume 10450, 104501M (2017) https://doi.org/10.1117/12.2280618

KEYWORDS: Extreme ultraviolet, Pellicles, Inspection, Deep ultraviolet, Photomasks, Silicon, Refractive index, Ruthenium, Extreme ultraviolet lithography, Polarization

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SPIE Journal Paper | 12 October 2017

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Sung-Gyu Lee, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041008, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041008

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

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SPIE Journal Paper | 7 October 2015

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-ho Ahn, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 14, Issue 04, 043501, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043501

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

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Proceedings Article | 19 March 2015 Paper

Multi-stack extreme-ultraviolet pellicle with out-of-band reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-Ho Ahn, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9422, 94221O (2015) https://doi.org/10.1117/12.2086052

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Semiconducting wafers, Radiation effects, Photomasks, Deep ultraviolet, Silicon, Silicon carbide, Extreme ultraviolet lithography

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Proceedings Article | 17 April 2014 Paper

Aerial image deformation caused by various defects of EUV pellicles

Sung-Gyu Lee, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482V (2014) https://doi.org/10.1117/12.2046623

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

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Showing 5 of 12 publications

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