Sung-Yong Cho
Senior Engineer at SAMSUNG Advanced Institute of Technology
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Ultraviolet radiation, Chromium, Atomic force microscopy, Optical testing, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Scatter measurement, Binary data

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Metrology, Etching, Inspection, Scanning electron microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Critical dimension metrology, Scatter measurement, EUV optics

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Etching, Dry etching, Particles, Manufacturing, Inspection, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Quartz, Dry etching, Particles, Manufacturing, Inspection, Atomic force microscopy, Scanning electron microscopy, Photomasks, Defect inspection

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Scattering, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Optics manufacturing, Standards development, Phase shifts

Showing 5 of 6 publications
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