Sunggon Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electronics, Image segmentation, Manufacturing, Electroluminescence, Inverse problems, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Calibration, Diffusion, Scanning electron microscopy, Photomasks, Cadmium sulfide, Optical proximity correction, SRAF, Critical dimension metrology, Performance modeling

Proceedings Article | 26 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Electron beam lithography, Image segmentation, Manufacturing, Control systems, Photomasks, SRAF, Critical dimension metrology, Stereolithography, Resolution enhancement technologies

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Atrial fibrillation, Data modeling, Image segmentation, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Process modeling

Showing 5 of 11 publications
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