Sungha Woo
Sr Manager at SK hynix Inc
SPIE Involvement:
Author
Profile Summary

I received the B.S. and M.S. degrees in Electronic and Electrical Engineering from Hanyang University, Seoul, Korea, in 2003 and 2006, respectively. Since February 2006, I am with the Photomask Development Team, SK hynix, Korea. I worked on 1st Patterning process and developed advanced blankmask until 2013. Most recently, I am working on management of mask defect verification with inspection and AIMS.
Publications (5)

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Image processing, Scanners, Error analysis, Reliability, Image analysis, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Lithographic illumination, Scanners, Error analysis, Inspection, Photomasks, Critical dimension metrology, Geometrical optics, Photoresist processing, Semiconducting wafers

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Laser therapeutics, Air contamination, Laser processing, Inspection, Chromium, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Mirrors, Sensors, Etching, Manufacturing, Photoresist materials, Photomasks, Critical dimension metrology, Optimization (mathematics), Photoresist processing, Temperature metrology

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Refractive index, Optical lithography, Quartz, Laser scattering, Control systems, Printing, Ultrafast lasers, Photomasks, Critical dimension metrology, Semiconducting wafers

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