I received the B.S. and M.S. degrees in Electronic and Electrical Engineering from Hanyang University, Seoul, Korea, in 2003 and 2006, respectively. Since February 2006, I am with the Photomask Development Team, SK hynix, Korea. I worked on 1st Patterning process and developed advanced blankmask until 2013. Most recently, I am working on management of mask defect verification with inspection and AIMS.