Sungho Jun
at Dongbu HiTek Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Image processing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image processing, Scanners, Computer simulations, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image processing, Scanners, Computer simulations, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Image resolution, Photomasks, Critical dimension metrology, Line edge roughness, Edge roughness, Resolution enhancement technologies

Showing 5 of 7 publications
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