Sungwoo Ko
Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Calibration, Metrology, Optical proximity correction, Data modeling, Instrument modeling, Scanning electron microscopy, Time metrology, Neural networks, Semiconducting wafers

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: SRAF, Model-based design, Metals, Instrument modeling, Lithography, Logic devices, Optical proximity correction, Shape memory alloys, Logic, Semiconducting wafers

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: SRAF, Optical lithography, Photomasks, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Lithography, Light sources, Phase shifts, Manufacturing

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